Preparation method for directly growing high density carbon nanotube array on carbon fiber paper base bottom
A carbon nanotube array and substrate technology, which is applied in nanotechnology, nanotechnology, chemical instruments and methods, etc., can solve the problems of high quality and unfavorable production, and achieve the effects of low cost, easy control, and easy subsequent utilization.
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example 1
[0015] The carbon paper was ultrasonically cleaned with dilute hydrochloric acid, acetone, alcohol, and deionized water one by one and dried for use. With 2M Fe(NO 3 ) 3 Solution and ethyl tetrasilicate to prepare a sol, which is prepared by uniformly coating the sol on the surface of carbon fiber paper by the spin coating method. In this example, the spin coating speed is preferably 4000 rpm, and the spin coating time is preferably 1 minute. Place the carbon fiber paper coated with Fe-containing sol in the chamber of the chemical vapor deposition system, start to heat up, the target temperature is 300°C, and keep for 1 hour; the furnace temperature continues to rise to 500°C, and the reducing gas hydrogen is introduced to keep The time is 60 minutes; the furnace temperature continues to rise to 900° C., and methane and nitrogen are introduced at the same time. The hydrogen:methane:nitrogen ratio is 1:4:10. Control the closing degree of the vacuum butterfly valve to ensure ...
example 2
[0017] Carbon paper pretreatment process is the same as example 1. With 1.5M Fe(NO 3 ) 3 Solution and ethyl tetrasilicate to prepare a sol, and the sol was uniformly coated on the surface of carbon fiber paper by dipping and pulling method, and the pulling speed in this example was 10 cm / min. After the wet film was heat-treated at 100°C, it was dipped and pulled repeatedly, and the number of times of pulling was 5 times. Place the carbon fiber paper coated with Fe-containing sol in the chamber of the chemical vapor deposition system, start to heat up, the target temperature is 300°C, and keep for 1 hour; the furnace temperature continues to rise to 500°C, and the reducing gas hydrogen is introduced to keep The time is 60 minutes; the furnace temperature continues to rise to 900° C., and methane and nitrogen are introduced at the same time. The hydrogen:methane:nitrogen ratio is 1:4:10. Control the closing degree of the vacuum butterfly valve to ensure that the air pressure...
example 3
[0019] Carbon paper pretreatment process is the same as example 1. With 1M Ni(NO 3 ) 3 The sol was prepared with methyl orthosilicate, and the sol was evenly coated on the surface of carbon fiber paper by spin coating. In this example, the rotational speed of the spin coating is preferably 5000 rpm, and the spin coating time is preferably 30 seconds. Place the carbon fiber paper coated with Ni-containing sol in the chamber of the chemical vapor deposition system, start to heat up, the target temperature is 300°C, and keep for 1 hour; the furnace temperature continues to rise to 400°C, and the reducing gas hydrogen is introduced to keep The time is 90 minutes; the furnace temperature continues to rise to 750° C., and methane and nitrogen are introduced at the same time. The hydrogen:methane:nitrogen ratio is 1:4:10. Control the closing degree of the vacuum butterfly valve to ensure that the air pressure in the whole reaction process is about 400Pa; after 30 minutes of react...
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