Method for preparing crystalline-silicon heterojunction solar cell
A solar cell and heterojunction technology, applied in the field of solar energy, can solve the problems of affecting the quality of amorphous silicon film, the effect cannot be guaranteed, and the yield rate is reduced, so as to improve the passivation effect, reduce the leakage current, and reduce the cost of chemical cleaning. required effect
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[0049] A method for preparing a crystalline silicon heterojunction solar cell, comprising the steps of:
[0050] The first step is to chemically clean the N-type monocrystalline silicon wafer;
[0051] The second step is to corrode the above-mentioned silicon chip and form a micron-scale pyramid texture structure on the front and back sides;
[0052] When forming the pyramid suede structure, the suede treatment means such as alkaline corrosion is usually used for smooth and rounding treatment, so as to achieve the purpose of removing burrs and peaks;
[0053]The third step is to use ion implantation method to implant Si ions and B ions successively on the front and back of the silicon wafer, so as to form intrinsic amorphous silicon films with a thickness of 20-30 nm on the upper and lower surfaces of the silicon wafer;
[0054] The fourth step is to use the plasma etching back process to etch back the intrinsic amorphous silicon thin film on the front and back sides of the s...
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