Golden low-emissivity coated glass and manufacturing method thereof
A technology of low-emission coating and manufacturing method, applied in chemical instruments and methods, glass/slag layered products, metal layered products, etc. , The product cannot obtain golden appearance and other problems, to achieve excellent shading performance, pure appearance and color, and good energy saving effect.
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Embodiment 1
[0044] A golden low-emissivity coated glass, which deposits the following films sequentially on the surface of a glass substrate: a silicon nitride buffer layer film, a nickel-chromium alloy induction layer film, a gold functional layer film, a nickel-chromium alloy induction layer film, a ZnO:Al protective layer, According to the order of deposition, the thicknesses of the film structures of each layer are as follows: the thickness of the silicon nitride buffer layer is 21nm, the thickness of the nickel-chromium alloy induction layer is 3nm, the thickness of the gold functional layer is 40nm, the second nickel-chromium alloy induction layer The thickness of the ZnO:Al protective layer is 3nm, the thickness of the ZnO:Al protective layer is 12nm, and the glass substrate adopts float glass.
[0045] A method for manufacturing golden low-emissivity coated glass as described above, characterized in that it comprises the following steps:
[0046] Step 1: Substrate pretreatment, us...
Embodiment 2
[0064] A golden low-emissivity coated glass, which deposits the following films sequentially on the surface of a glass substrate: a silicon nitride buffer layer film, a nickel-chromium alloy induction layer film, a gold functional layer film, a nickel-chromium alloy induction layer film, a ZnO:Al protective layer, According to the order of deposition, the thicknesses of the film structures of each layer are as follows: the thickness of the silicon nitride buffer layer is 22nm, the thickness of the nickel-chromium alloy induction layer is 3.5nm, the thickness of the gold functional layer is 45nm, and the thickness of the second nickel-chromium alloy induction layer is 45nm. The thickness of the layer is 3.5nm, the thickness of the ZnO:Al protective layer is 13nm, and the glass substrate adopts float glass.
[0065] A method for manufacturing golden low-emissivity coated glass as described above, characterized in that it comprises the following steps:
[0066] Step 1: Substrate ...
Embodiment 3
[0084]A golden low-emissivity coated glass, which deposits the following films sequentially on the surface of a glass substrate: a silicon nitride buffer layer film, a nickel-chromium alloy induction layer film, a gold functional layer film, a nickel-chromium alloy induction layer film, a ZnO:Al protective layer, According to the order of deposition, the thicknesses of the film structures of each layer are as follows: the thickness of the silicon nitride buffer layer is 23nm, the thickness of the nickel-chromium alloy induction layer is 4nm, the thickness of the gold functional layer is 42nm, the second nickel-chromium alloy induction layer The thickness of the ZnO:Al protective layer is 4nm, the thickness of the ZnO:Al protective layer is 14nm, and the glass substrate adopts float glass.
[0085] A method for manufacturing golden low-emissivity coated glass as described above, characterized in that it comprises the following steps:
[0086] Step 1: Substrate pretreatment, usi...
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