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Low-pressure pulse vacuum nitriding method and low-pressure pulse vacuum nitriding device for titanium alloy

A low-voltage pulse, titanium alloy technology, applied in the direction of metal material coating process, coating, solid diffusion coating, etc., can solve the problems of hindering the inward diffusion of nitrogen, slow nitriding speed, hindering the penetration of nitrogen, etc. Oxidation, Barrier Reduction, and Adsorption Enhancement Effects

Inactive Publication Date: 2013-12-25
GUIZHOU NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the conventional gas nitriding of titanium alloys increases with the thickness of the nitride film. Nitrogen and titanium have a strong affinity. The dense nitride layer will hinder the penetration of nitrogen. At the same time, the titanium alloy is easily oxidized, and the dense oxide film will It hinders the inward diffusion of nitrogen, so the existing gas nitriding technology has the disadvantages of slow nitriding speed, thin layer, brittle layer and long processing time.
Therefore, the existing gas nitriding technology on the surface of titanium alloy is still not ideal enough to meet the needs of use.

Method used

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  • Low-pressure pulse vacuum nitriding method and low-pressure pulse vacuum nitriding device for titanium alloy
  • Low-pressure pulse vacuum nitriding method and low-pressure pulse vacuum nitriding device for titanium alloy
  • Low-pressure pulse vacuum nitriding method and low-pressure pulse vacuum nitriding device for titanium alloy

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Embodiment 1

[0029] Embodiment 1: TC4 titanium alloy sample is carried out infiltration pretreatment (arrangement of sample, cleaning etc.), the sample or workpiece through pretreatment is packed in the reactor tank of reactor, and reactor tank is sealed , Vacuum after leak detection, and heat the reactor through a heating furnace. The vacuum nitriding process parameters are: temperature 800°C, nitriding medium 99.999% high-purity N 2 , Make the nitriding medium pressure in the reactor tank change between 0 MPa~0.015MPa, promptly fill high-purity N first by the device of the present invention 2 Close the nitrogen control valve for 15 min after 30 min (at this time, the high-purity N in the reactor tank 2 Keep the pressure at 0.015MPa), then quickly open the exhaust control valve for vacuuming for 30 minutes (at this time, the nitrogen control valve remains closed), then close the exhaust control valve for 5 minutes, and then quickly open the nitrogen control valve to the reactor tank Fill...

Embodiment 2

[0030] Embodiment 2: TC4 titanium alloy sample is carried out infiltration pretreatment (arrangement of sample, cleaning etc.), the sample or workpiece through pretreatment is packed in the reactor tank of reactor, and reactor tank is sealed , Vacuum after leak detection, and heat the reactor through a heating furnace. The vacuum nitriding process parameters are: temperature 850 ° C, nitriding medium is high-purity N with a molar ratio of 1:1 2 + High-purity Ar, so that the pressure of the nitriding medium in the reactor tank varies between 0 MPa and 0.015 MPa, that is, the device of the present invention first fills the nitriding medium for 30 minutes and then closes the nitrogen control valve and the argon control valve for 15 minutes at the same time (At this time, the nitriding medium pressure in the reactor tank is kept at 0.015MPa), then quickly open the exhaust control valve for vacuuming for 30 minutes (at this time, the nitrogen control valve and argon control valve re...

Embodiment 3

[0031] Embodiment 3: TC4 titanium alloy sample is carried out pre-infiltration pretreatment (arrangement of sample or workpiece, cleaning etc.), the sample through pretreatment or workpiece are packed in the reactor tank of reactor, and reactor Vacuumize the tank after sealing and leak detection, and heat the reactor through a heating furnace. The vacuum nitriding process parameters are: temperature 800°C, nitriding medium 99.999% high-purity N 2 1. Make the nitriding medium pressure in the reactor tank vary between 0 MPa~0.020MPa, that is, first fill the nitriding medium with the device of the present invention for 30 minutes and then close the nitrogen control valve for 15 minutes (at this time, the high-purity nitrogen in the reactor tank N 2 Keep the pressure at 0.020MPa), then quickly open the exhaust control valve for vacuuming for 30 minutes (at this time, the nitrogen control valve remains closed), then close the exhaust control valve for 5 minutes, and then quickly op...

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Abstract

The invention discloses a low-pressure pulse vacuum nitriding method and a low-pressure pulse vacuum nitriding device for a titanium alloy. The low-pressure pulse vacuum nitriding method comprises the steps of firstly putting a titanium alloy sample into an inner cavity of a reactor tank after preprocessing the surface of the titanium alloy sample, vacuumizing the reactor tank subjected to sealing and leakage detecting, simultaneously heating the reactor tank to maintain the temperature of the inner cavity of the reactor tank at 700-1000 DEG C, and adding a nitriding gas medium into the inner cavity of the reactor tank in a pulse gas filling manner (namely repeatedly and periodically adding the nitriding gas medium by carrying out ventilation, closing-maintaining, air exhausting and closing-maintaining while ventilating), so as to change the pressure of the nitriding gas medium in the inner cavity of the reactor tank in a rectangular pulse manner, wherein the period range of a rectangular pulse is 10-200 minutes, and the pressure of the nitriding gas medium is maintained within a range of 0-0.050MPa. The low-pressure pulse vacuum nitriding device has the advantages of simplicity in operation, suitability in batch production, high machining efficiency, good and stable product quality and the like.

Description

technical field [0001] The invention relates to a titanium alloy low pressure pulse vacuum nitriding method and device, belonging to the technical field of titanium alloy nitriding. Background technique [0002] Due to the advantages of high specific strength, high temperature resistance, good corrosion resistance, good low temperature toughness and biocompatibility, titanium alloys are widely used in the fields of national defense, chemical industry, energy, aerospace and bioengineering. However, because the surface hardness of titanium alloy is not high, it has disadvantages such as poor wear resistance and fatigue resistance, and it is easy to cause adhesive wear with many materials. [0003] Surface modification technology is an effective way to improve the hardness, wear resistance and fatigue resistance of titanium alloys. According to research at home and abroad, the surface modification technology of titanium alloys has roughly experienced electroplating, chemical p...

Claims

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Application Information

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IPC IPC(8): C23C8/24
Inventor 刘静杨闯马亚芹王亮杨宏霞段志光杨玲冯莹
Owner GUIZHOU NORMAL UNIVERSITY
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