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Voltage-modulated periodic subwavelength metal grating filter and preparation method thereof

A technology of metal grating and voltage modulation, applied in diffraction grating, nonlinear optics, optics, etc., can solve the problems affecting the high integration and multi-function of the system, and achieve the effect of easy implementation and simple process

Active Publication Date: 2014-04-23
SOUTHEAST UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Since the abnormal transmission phenomenon of the subwavelength metal slit grating array was discovered, due to its unique optical characteristics and increasingly advanced nanofabrication technology, its potential application value has gradually been realized, one of which is the filter, which changes the narrow The structural parameters of the slit grating, such as the slit width, height and period, can obtain filters of different bands. For the metal slit grating with fixed structural parameters and shapes, its filtering characteristics are also fixed. If you want to change its filtering characteristics, you need Design a slit grating with new structural parameters, which is unfavorable for some optoelectronic systems that require real-time dynamic band adjustment, and affects the high integration and multifunctionality of the system

Method used

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  • Voltage-modulated periodic subwavelength metal grating filter and preparation method thereof
  • Voltage-modulated periodic subwavelength metal grating filter and preparation method thereof
  • Voltage-modulated periodic subwavelength metal grating filter and preparation method thereof

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preparation example Construction

[0025] Such as image 3 Shown is a method for preparing a voltage-modulated periodic sub-wavelength metal grating filter, including the following steps in sequence:

[0026] (1) On a layer of transparent conductive glass, use thermal evaporation or magnetron sputtering to prepare a layer of metal film, the thickness of the metal film is a, and the material of the metal film can be precious metal material or ordinary metal material;

[0027] (2) Spin-coat a layer of photoresist on the surface of the metal film and dry it, the thickness of the photoresist is b;

[0028] (3) Groove arrays are prepared by etching processes such as focused ion beams to form slits arranged in a periodic array, and the depth of the grooves is a+b;

[0029] (4) Coating a photoelectric crystal film on the surface of the groove array by using a coating process such as electron beam evaporation, and the thickness of the photoelectric crystal film is a;

[0030] (5) Use cleaning solution to clean and dr...

Embodiment 1

[0034] In order to realize a periodic sub-wavelength metal grating filter, potassium dihydrogen phosphate is selected as the filler. ITO transparent glass was selected as the substrate, and a layer of gold film with a thickness of 300nm was prepared on the surface by thermal evaporation, and a layer of photoresist with a thickness of 200nm was spin-coated on the surface of the gold film and dried. Use focused ion beam technology to etch a periodic rectangular groove array with a depth of 500nm, a width of 200nm, and a period of 500nm, and then use electron beam evaporation to coat a layer of potassium dihydrogen phosphate with a thickness of 300nm on the surface of the groove array, and then use The cleaning solution cleans off the photoresist in the structure, dries it, and finally covers the upper surface with an ITO transparent electrode. And connect the upper and lower electrodes to the voltage generator.

[0035] The incident light is incident from the ITO transparent el...

Embodiment 2

[0037] In order to realize a periodic sub-wavelength metal grating filter, lithium tantalate was selected as the grating slit filler, ITO transparent glass was selected as the substrate, and a silver film with a thickness of 250nm was prepared on the surface by magnetron sputtering. A layer of photoresist with a thickness of 150 nm was spin-coated on the surface of the silver film and dried. Use focused ion beam technology to etch a periodic rectangular groove array with a depth of 400nm, a width of 250nm, and a period of 400nm, and then use electron beam evaporation to coat a layer of lithium tantalate with a thickness of 250nm on the surface of the groove array, and then use cleaning Clean the photoresist in the structure with liquid, dry it, and finally cover the upper surface with ITO transparent electrodes. And connect the upper and lower electrodes to the voltage generator.

[0038] The incident light is incident from the ITO transparent electrode below the filter, and ...

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Abstract

The invention discloses a voltage-modulated periodic subwavelength metal grating filter and a preparation method thereof. The filter comprises two transparent conductive glass layers, periodic metal gratings, photoelectric crystals and an electric field generation device, wherein slits distributed in periodic arrays are formed in the periodic metal gratings and filled with the photoelectric crystals; the two transparent conductive glass layers fit the upper and lower surfaces of the periodic metal gratings; the photoelectric crystals are hermetically fixed in the slits of the metal gratings; the electric field generation device is used for generating uniform adjustable electric fields on the two transparent conductive glass layers to change the refractive index parameters of the photoelectric crystals. According to the filter, the refractive index properties of filling materials and the transmittance properties of the metal gratings can be changed by changing external voltages of upper and lower transparent conductive glass electrodes to achieve the purpose of voltage modulation of filter properties.

Description

technical field [0001] The invention relates to a voltage-modulated periodic sub-wavelength metal grating filter and a preparation method thereof, belonging to integrated photonic devices. Background technique [0002] Since the abnormal transmission phenomenon of the subwavelength metal slit grating array was discovered, due to its unique optical characteristics and increasingly advanced nanofabrication technology, its potential application value has gradually been realized, one of which is the filter, which changes the narrow The structural parameters of the slit grating, such as the slit width, height and period, can obtain filters of different bands. For the metal slit grating with fixed structural parameters and shapes, its filtering characteristics are also fixed. If you want to change its filtering characteristics, you need Designing a slit grating with new structural parameters is unfavorable for some optoelectronic systems that require real-time dynamic band adjustm...

Claims

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Application Information

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IPC IPC(8): G02F1/03G02B5/18G02B5/20
Inventor 王琦龙翟雨生吴晟琦黄倩倩齐志央
Owner SOUTHEAST UNIV
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