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Method for preparing ultra-clean high-purity hydrochloric acid

A hydrochloric acid and net high technology, applied in chlorine/hydrogen chloride purification, chlorine/hydrogen chloride, etc., can solve the problems of shortened service life, shedding of resin groups, large volume and low concentration, etc., to prolong service life, reduce oxidation and reduce pollution Effect

Active Publication Date: 2014-08-13
XILONG SCI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are three deficiencies in this method: one is that the free Cl in the industrial hydrochloric acid will oxidize the anion exchange resin, and after oxidation, some groups will fall off and the chain will be broken in the resin, resulting in lower amines entering the hydrochloric acid solution, causing pollution to the hydrochloric acid , and reduce the exchange capacity of the anion resin and shorten its service life; the second is the addition of SnCl 2 Finally, it stays in dilute hydrochloric acid, which has a large volume and low concentration, making it difficult to recover; the third is SnCl 2 Cannot remove Ca which cannot be adsorbed by anion exchange resin 2+ 、Ba 2+ 、Sr 2+ Plasma

Method used

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  • Method for preparing ultra-clean high-purity hydrochloric acid
  • Method for preparing ultra-clean high-purity hydrochloric acid
  • Method for preparing ultra-clean high-purity hydrochloric acid

Examples

Experimental program
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Effect test

Embodiment 1

[0024] A. Pretreatment and primary distillation:

[0025] 36.5% industrial hydrochloric acid (single metal ion content is about 1-80ppm, free Cl concentration is 60ppm) is continuously filtered through ultra-pure polytetrafluoroethylene microfilter 1 with a pore size of 0.45μm at a speed of 500L / h, and high-purity quartz The glass heat exchanger group 2 is initially heated, the pretreated cellulose-based activated carbon fiber column 3 is dechlorinated, and the 201×7 strong basic anion resin column 4 is ion-exchanged, and the graphite heater impregnated with high-purity tetrafluoroethylene is used 5, 6 Heating and evaporating, controlling the steam pressure to about 0.12Mpa, the gas phase fraction passes through the ultra-pure polytetrafluoroethylene-impregnated graphite packing tower 7 to remove high boiling point substances (stripping and rectification), and then enters the thermal insulation and high-efficiency aerosol separator 8 to remove mist droplets and particles. The...

Embodiment 2

[0039] A. Pretreatment and primary distillation:

[0040] 31% industrial hydrochloric acid (single metal ion content is about 1-80ppm, free Cl concentration is 50ppm) is continuously filtered through ultra-pure polytetrafluoroethylene microfilter 1 with a pore size of 0.45μm at a speed of 500L / h, and high-purity quartz The glass heat exchanger group 2 is initially heated, the pretreated cellulose-based activated carbon fiber column 3 is dechlorinated, and the 201×7 strong basic anion resin column 4 is ion-exchanged, and the graphite heater impregnated with high-purity tetrafluoroethylene is used 5, 6 Heating and evaporating, controlling the steam pressure to about 0.15Mpa, the gas phase fraction passes through the ultra-pure polytetrafluoroethylene-impregnated graphite packing tower 7 to remove high-boiling point substances (stripping and rectification), and then enters the thermal insulation and high-efficiency aerosol separator 8 to remove mist droplets and particles. The g...

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Abstract

The invention discloses an industrial method for preparing ultra-clean high-purity reagent-grade hydrochloric acid from industrial hydrochloric acid through purification. The method comprises the following steps: filtering the industrial hydrochloric acid, dechlorinating activated carbon fibers, performing ion exchange through an anion exchange resin column, heating and evaporating; removing high-boiling-point substances out of gas-phase fractions through a super-pure polytetrafluoroethylene-dipped graphite packing tower, washing the gas-phase fractions in a stannous mono-sulfate solution, washing with high-purity water, then absorbing the high-purity water , thus obtaining the ultra-clean high-purity hydrochloric acid product. The method also can comprise a step of second distillation. The aim of realizing high-quality high-efficiency industrial batch production of ultra-clean high-purity reagent hydrochloric acid is reached.

Description

technical field [0001] The invention relates to a method for producing reagent-grade hydrochloric acid, in particular to an industrialized method for preparing ultra-clean and high-purity reagent-grade hydrochloric acid from industrial-grade hydrochloric acid through purification. Background technique [0002] Ultra-clean and high-purity reagents (Ultra-clean and High-purity Reagents), known internationally as Process Chemicals, are key basic chemicals in the production of integrated circuits (IC) and very large-scale integrated circuits (VLSI). One of the materials is mainly used for chip cleaning and etching. In addition, ultra-clean and high-purity reagents are also used for chip doping and precipitation processes and cleaning of the surface of silicon wafers. The purity and cleanliness of ultra-clean and high-purity reagents have a very important impact on the yield, electrical performance and reliability of integrated circuits. The main application fields of ultra-clea...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B7/07
Inventor 李湛江肖克强黄伟鹏肖启发廖小深
Owner XILONG SCI CO LTD
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