A method for preparing a tantalum-based alloy with a gradient structure through solid solution strengthening
A gradient structure and solid solution strengthening technology, which is applied in the field of preparation of high-strength tantalum alloys, can solve problems such as gaps, and achieve the effects of prolonging service life, excellent performance, and good coordination
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Embodiment 1
[0031] This embodiment includes the following steps:
[0032] Step 1. Put 400g of tantalum powder in the nitriding furnace, and adjust the nitrogen flow rate of the nitriding furnace to 0.1m 3 / h, the tantalum powder is subjected to oxynitridation treatment at 900°C for 15 minutes; the mass purity of the tantalum powder is not less than 99.5%, the particle size of the tantalum powder is not less than 200 mesh, and the oxynitride treatment process Control the volume content of oxygen in the nitriding furnace to not less than 5%;
[0033] Step 2. Put the tantalum powder treated by oxynitriding in step 1 in a plasma sintering furnace, adjust the pressure to 300MPa, and sinter the tantalum powder treated by oxynitriding at 950°C for 5 minutes to obtain Tantalum-based alloys;
[0034] Step 3. Place the tantalum-based alloy described in step 2 in a vacuum annealing furnace, and adjust the vacuum degree to 10 -2 Pa, the tantalum-based alloy was vacuum annealed at 900°C for 1h.
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Embodiment 2
[0052] This embodiment includes the following steps:
[0053] Step 1. Put 400g of tantalum powder in the nitriding furnace, and adjust the nitrogen flow rate of the nitriding furnace to 0.12m 3 / h, the oxygen flow rate is 0.08m 3 / h, the tantalum powder is subjected to oxynitridation treatment at 800°C for 30 minutes; the mass purity of the tantalum powder is not less than 99.5%, the particle size of the tantalum powder is not less than 200 mesh, and the oxynitride treatment process Control the volume content of oxygen in the nitriding furnace to not less than 5%;
[0054] Step 2. Put the tantalum powder treated by oxynitriding in step 1 in a plasma sintering furnace, adjust the pressure to 200MPa, and sinter the tantalum powder treated by oxynitriding at 1000°C for 3 minutes to obtain Tantalum-based alloys;
[0055] Step 3. Place the tantalum-based alloy described in step 2 in a vacuum annealing furnace, and adjust the vacuum degree to 10 -1 Pa, the tantalum-based alloy w...
Embodiment 3
[0073] Step 1. Put 400g of tantalum powder in the nitriding furnace, and adjust the nitrogen flow rate of the nitriding furnace to 0.08m 3 / h, the tantalum powder is subjected to oxynitridation treatment at 1000°C for 5 minutes; the mass purity of the tantalum powder is not less than 99.5%, the particle size of the tantalum powder is not less than 200 mesh, and the oxynitride treatment process Control the volume content of oxygen in the nitriding furnace to not less than 5%;
[0074] Step 2. Put the tantalum powder treated by oxynitriding in step 1 in a plasma sintering furnace, adjust the pressure to 400MPa, and sinter the tantalum powder treated by oxynitriding at 900°C for 10 minutes to obtain Tantalum-based alloys;
[0075] Step 3. Place the tantalum-based alloy described in step 2 in a vacuum annealing furnace, and adjust the vacuum degree to 10 -3 Pa, the tantalum-based alloy was vacuum annealed at 1000°C for 0.5h.
[0076] As the distance from the surface of the tant...
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