Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof

A technology of urethane acrylate and photosensitive alkali, applied in the field of ultraviolet light curing, can solve the problems of high viscosity, low activity, and a large number of diluents, and achieve the effect of high resolution and good comprehensive performance

Inactive Publication Date: 2014-12-10
SUZHOU RUIHONG ELECTRONIC CHEM CO LTD +1
View PDF5 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the molecular weight of linear polyurethane acrylate is large, it has the disadvantages of high viscosity, low activity and the need for a large amount of diluent.
[0004] At present, there are few reports on the application of linear polyurethane in photoresist

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof
  • Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] (1) Synthesis of photosensitive alkali-soluble urethane acrylate resin: add isophorone diisocyanate (IPDI) 44.46g and dibutyltin dilaurate in a 250ml four-necked round-bottomed flask equipped with a thermometer, a reflux condenser, and a stirrer (DBTDL) 0.019g, and then add 24.22g of N,N-dimethylformamide (DMF), raise the temperature to 80°C, and then add 13.40g of 2,2-dimethylolpropionic acid (DMPA) three times. The degree of reaction was measured by toluene-di-n-butylamine back titration until the NCO group content reached the theoretical value, and the theoretical value was reached at 80°C for 2 hours, then the temperature was lowered to 75°C, and polymerization inhibitors 2 and 6 were added to it. -Di-tert-butyl p-cresol 0.15g, then add 39.00g of hydroxyethyl methacrylate (HEMA), until no NCO can be detected at 2265cm by infrared spectrum -1 At the time of the absorption peak, stop the reaction, the required time is 5h, and obtain the photosensitive alkali-soluble u...

Embodiment 2

[0022] (1) Synthesis of photosensitive alkali-soluble urethane acrylate resin: add toluene diisocyanate (TDI) 34.83g and dibutyltin dilaurate (DBTDL) in a 250ml four-neck round bottom flask equipped with a thermometer, a reflux condenser, and a stirrer 0.017g, then 24.22g of N,N-dimethylformamide (DMF) was added, the temperature was raised to 70°C, and 13.40g of 2,2-dimethylolpropionic acid (DMPA) was added three times. The degree of reaction was measured by the toluene-di-n-butylamine back titration method until the NCO group content reached the theoretical value, and the theoretical value was reached at 70 ° C for 2.5 hours, then the temperature was raised to 75 ° C, and polymerization inhibitor 2 was added thereto. 0.13g of 6-di-tert-butyl-p-cresol, then add 39.00g of hydroxyethyl methacrylate (HEMA), until no NCO can be detected at 2265cm -1 At the time of the absorption peak, stop the reaction, the required time is 4.5h, and obtain the photosensitive alkali-soluble uretha...

Embodiment 3

[0025] (1) Synthesis of photosensitive alkali-soluble urethane acrylate resin: add isophorone diisocyanate (IPDI) 44.46g and dilauric acid di Butyltin (DBTDL) 0.021g, then N,N-dimethylformamide (DMF) 25.90g was added, the temperature was raised to 80°C, and 2,2-dimethylolpropionic acid (DMPA) 17.42g was added three times. The degree of reaction was measured by the toluene-di-n-butylamine back titration method until the NCO group content reached the theoretical value, and the theoretical value was reached at 80°C for 2.5 hours, then the temperature was lowered to 75°C, and polymerization inhibitor 2 was added thereto. 0.16g of 6-di-tert-butyl p-cresol, 41.72g of pentaerythritol triacrylate (PETA), until NCO can not be detected at 2265cm by infrared spectrum -1 At the time of the absorption peak, stop the reaction, the required time is 5.5h, and obtain the photosensitive alkali-soluble urethane acrylate resin.

[0026] (2) Preparation and development test of photoresist composi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and a photoresist composition thereof, belonging to the technical field of ultraviolet curing. Carboxylic dibasic alcohol reacts with an isocyanate compound to obtain a NCO-terminated prepolymer, and finally, termination is performed by a hydroxy acrylate monomer to obtain the polyurethane acrylate resin. By introducing the carboxylic group, the resin has alkali solubility; and by introducing the acrylate monomer, the resin has photosensitiveness. The method has the advantages of simple process and mild reaction conditions, and can control the molecular weight, acid value, double-bond equivalent weight and the like of the resin by changing the material proportion, thereby obtaining the resin applicable to the field of photoresists.

Description

technical field [0001] The invention relates to the technical field of ultraviolet curing, in particular to a photosensitive alkali-soluble urethane acrylate resin, a preparation method thereof and a photoresist composition. Background technique [0002] Urethane acrylate, as a class of light-curing materials with excellent comprehensive properties (including excellent flexibility, solvent resistance, low temperature resistance, abrasion resistance, good adhesion and thermal shock resistance, etc.), is widely used in light-curing materials. Curing coatings, inks, adhesives and electronic products and other industrial fields. [0003] Urethane acrylate has good adhesion, abrasion resistance and oil resistance due to the urethane chain link in its molecular chain, and is an important photoresist raw material. However, when the molecular weight of linear urethane acrylate is large, it has the disadvantages of high viscosity, low activity and the need for a large amount of dilu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08G18/67G03F7/027G03F7/004
CPCC08G18/672C08G18/348G03F7/004G03F7/027
Inventor 刘晓亚刘秋华刘敬成李虎郑祥飞林立成穆启道孙小侠
Owner SUZHOU RUIHONG ELECTRONIC CHEM CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap