Field effect diode and manufacturing method thereof
A field-effect diode and anode technology, which is applied in the direction of diode, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of increasing reverse leakage current of Schottky diode, degradation of electrical performance of Schottky diode, increase of on-state loss, etc. problem, to achieve the effect of good crystal quality, lower forward voltage drop, and lower forward conduction resistance
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[0061] The present invention will be described in detail below in conjunction with specific embodiments shown in the accompanying drawings. However, these embodiments do not limit the present invention, and any structural, method, or functional changes made by those skilled in the art according to these embodiments are included in the protection scope of the present invention.
[0062] Furthermore, repeated reference numerals or designations may be used in different embodiments. These repetitions are merely for the sake of simplicity and clarity of describing the present invention, and do not imply any relationship between the different embodiments or structures discussed.
[0063] The invention discloses a field effect diode, comprising:
[0064] Substrate;
[0065] a nucleation layer on said substrate;
[0066] a buffer layer located on the nucleation layer;
[0067] a back barrier layer on the buffer layer;
[0068] a channel layer on the back barrier layer;
[0069] ...
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