Preparation method of thickness-controllable nano-porous metal thin film

A nanoporous, metal thin film technology, applied in nanotechnology, metal material coating process, semiconductor/solid-state device manufacturing, etc., can solve the problem of difficulty in preparing thin films with controllable thickness, and achieve precise thickness control, convenient deployment, alloying Material uniformity

Inactive Publication Date: 2015-02-25
UNIV OF JINAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to overcome the disadvantages of difficulty in preparing thin films with controllable thickness in the prior art, and provide a method for preparing nanoporous metal thin films with precise and controllable thickness.

Method used

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  • Preparation method of thickness-controllable nano-porous metal thin film
  • Preparation method of thickness-controllable nano-porous metal thin film
  • Preparation method of thickness-controllable nano-porous metal thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] (1) Make a hollow Zn metal sheet and a complete Ag metal sheet, place the hollow Zn sheet on the Ag sheet, and combine the two metal sheets as a target for pulsed laser deposition;

[0025] (2) Deposit a layer of Ag-Zn alloy thin film on the substrate by pulse laser deposition method, and the vacuum degree in the laser pulse cavity is 10 -4 Pa, when the film is deposited, the substrate temperature is 200 degrees Celsius, the laser frequency is 8Hz, the laser energy is 300mj, and the number of pulsed lasers is 5000 times.

[0026] (3) Put the Ag-Zn alloy film into an annealing furnace and anneal at 250 degrees Celsius for 2 hours.

[0027] (4) Soak the annealed alloy film in 1wt% NaOH solution for 6 hours for dealloying to obtain Ag nanoporous metal film.

Embodiment 2

[0029] 1) Make hollowed-out Zn metal sheets, Ag metal sheets and complete Au metal sheets. The hollowed-out Zn sheet is placed on the hollowed-out Ag sheet, and the Au metal sheet is placed on the bottom layer. The three metal sheets are combined as targets for magnetron sputtering;

[0030] (2) Deposit a layer of Zn-Ag-Au alloy film on the substrate by pulsed laser deposition method, and the vacuum degree in the vacuum chamber is 10 -4 Pa, when the film is deposited, the substrate temperature is 300 degrees Celsius, the sputtering power is 20W, and the sputtering time is 0.5 hours.

[0031] (3) Put the Ag-Zn alloy film into an annealing furnace and anneal at 350 degrees Celsius for 4 hours.

[0032] (4) Soak the annealed alloy film in 1wt% NaOH solution for 12 hours for dealloying to obtain Ag-Au nanoporous metal film.

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Abstract

The invention relates to a method for preparing a nano-porous metal thin film by virtue of laser pulse deposition. The method comprises the following steps: firstly preparing a hollow metal sheet A according to a required proportion, and compounding the metal sheet A and a metal sheet B to form a target material; then depositing a layer of an alloy thin film on a substrate by using the target material as a raw material by virtue of a pulse laser deposition method, wherein the vacuum degree in a vacuum cavity is 10<-5> to 10<5>Pa, the substrate temperature is 50-1100 DEG C in thin film deposition, the laser frequency is 1-10Hz, and the laser energy is 50-300mj; adjusting the thickness of an alloy thin film according to pulse laser times and laser energy density; annealing the alloy thin film in an annealing furnace for 0.5-6 hours at 80-1000 DEG C; and soaking the alloy thin film subjected to annealing treatment into a NaOH solution with the concentration of 1-10wt% or an H2SO4 solution with the concentration of 1-10wt%, and performing de-alloying to obtain the nano-porous metal thin film. According to the method disclosed by the invention, the alloy does not need to be smelted at high temperature, the thin film thickness can be accurately controlled according to the pulse times, raw materials can be saved, and apertures can be adjusted according to the heating and thermal insulation time.

Description

technical field [0001] The invention relates to a preparation method of nanoporous metal, in particular to a new method for preparing nanoporous film with controllable thickness. [0002] Background technique [0003] Nanoporous metals are a class of metal materials with a special structure, due to their unique structural characteristics and unique properties in physics, chemistry, mechanics, etc., nanoscale pores, three-dimensional bicontinuous open-oriented band / channel structure, and The extremely high specific surface area makes nanoporous metal materials exhibit unique properties different from traditional dense materials, and shows broad application prospects in catalysis, sensing, excitation, optics and other fields. At present, the electrodeposition method is mostly used to prepare nanoporous gold. Because the electrodeposition method has many disadvantages, the process is complicated, the operation is difficult, and the repeatability is not good, it is not easy to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35H01L21/285B82Y40/00
CPCC23C14/28
Inventor 杨晓朋马振壬曹丙强乔振松
Owner UNIV OF JINAN
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