Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film

A magnetron sputtering and uniform heating technology, which is applied in the direction of sputtering plating, ion implantation plating, metal material coating process, etc., can solve the problem of inaccurate and effective adjustment and control of temperature resistance uniformity, affecting displays, and instruments Service life, reduce the quality of ITO film products and other issues, to achieve the effect of simple method, saving production cost and prolonging service life

Active Publication Date: 2015-02-25
LUOYANG KANGYAO ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation process conditions, such as tin content in the target, deposition rate, substrate temperature, sputtering power, and subsequent annealing treatment, all have a great impact on the photoelectric properties of the ITO thin film; however, the existing technology on the glass substrate The optical properties of the ITO film prepared at low temperature are poor, the film oxidation is incomplete, and the structure is incomplete; especially for the crystal s...

Method used

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  • Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film
  • Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film
  • Uniform heating device and method of magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] As shown in the figure, a uniform heating device for ITO film magnetron sputtering magnetic levitation vehicle target is composed of: continuous vacuum magnetron sputtering coating equipment room 1, vacuum room temperature control door 2, vacuum door heater 3, vacuum door Uniform temperature heater 3-1, magnetron sputtering magnetic levitation car target device 4, vacuum wall upper heater 5, vacuum wall middle heater 6, vacuum wall lower heater 7, vacuum room control rear wall 8 , a samarium-cobalt magnet device 9 is formed; it is characterized in that: one side of the continuous vacuum magnetron sputtering coating equipment room 1 is provided with a vacuum room temperature control door 2, and the other side is provided with a vacuum room temperature control rear wall 8; the vacuum room temperature A magnetron sputtering magnetic levitation car target device 4 is correspondingly arranged between the back wall body 8 and the vacuum room temperature control door 2, and a s...

Embodiment 2

[0042] As shown in the figure, a method for uniformly heating the ITO film magnetron sputtering magnetic levitation car target, the specific process method is as follows: start and run the ITO film continuous vacuum magnetron sputtering coating equipment, and continuously vacuum magnetron sputtering coating Vacuumize the equipment room 1 so that the background vacuum is 5×10 -4 Pa-6.8×10 -4 Pa, the sputtering gas Argon Ar and Oxygen O as a supplementary component 2 ; Under vacuum conditions, at least one rectangular target is loaded on the magnetron sputtering magnetic levitation vehicle target device 4, which is made of 3-10%SnO 2 and 90%-97%In 2 o 3 The formed powder is sintered by heat and static pressure to control the vacuum door heater 3, the vacuum door uniform temperature heater 3-1 and the vacuum wall upper heater 5, the vacuum wall intermediate heater 6, and the vacuum wall heater. The lower heater 7 evenly heats the target on the magnetron sputtering magnetic le...

Embodiment 3

[0046] As shown in the figure, a method for uniformly heating the ITO film magnetron sputtering magnetic levitation car target, the specific process method is as follows: start and run the ITO film continuous vacuum magnetron sputtering coating equipment, and continuously vacuum magnetron sputtering coating Vacuumize the equipment room 1 so that the background vacuum is 5×10 -4 Pa, the sputtering gas Argon Ar and Oxygen O as a supplementary component 2 ; Under vacuum conditions, at least one rectangular target is loaded on the magnetron sputtering magnetic levitation vehicle target device 4, which is made of 10% SnO 2 and 90%In 2 o 3 The formed powder is sintered by heat and static pressure to control the vacuum door heater 3, the vacuum door uniform temperature heater 3-1 and the vacuum wall upper heater 5, the vacuum wall intermediate heater 6, and the vacuum wall heater. The lower heater 7 evenly heats the target on the magnetron sputtering magnetic levitation vehicle ta...

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Abstract

Disclosed is a uniform heating device and method of a magneto-controlled sputtering maglev vehicle target of ITO (indium tin oxide) film. During large-scale continuous production of ITO film, by controlling heating temperatures of all parts of the magneto-controlled sputtering maglev vehicle target, uniform resistor is acquired by the ITO thin film, with electrical resistivity reaching 2*10-4Omega/cm and transmittance reaching 90% or above. Product quality of the ITO thin film is improved, work efficiency is greatly increased, production cost is saved, service life is prolonged by two times or above, and energy consumption and environment protection are achieved. The uniform heating device is composed of a continuous vacuum magneto-controlled sputter coating equipment chamber, a vacuum chamber temperature control door, vacuum door heaters, vacuum door isothermal heaters, magneto-controlled sputtering maglev vehicle target device, upper vacuum wall-mounted heaters, middle vacuum wall-mounted heaters, lower vacuum wall-mounted heaters, a rear temperature-control wall of the vacuum chamber and a samarium cobalt magnet device.

Description

technical field [0001] The invention relates to an ITO film heating device and a method thereof, in particular to an ITO film magnetron sputtering magnetic levitation vehicle target uniform heating device and a method thereof. Background technique [0002] ITO transparent conductive film is doped indium tin oxide film, referred to as ITO film, which is the abbreviation of Indium Tin Oxide. ITO thin film is an n-type semiconductor material, which has many excellent physical and chemical properties, such as high visible light transmittance and electrical conductivity, good adhesion to most substrates, strong hardness and good It is resistant to acid, alkali and organic solvents, so it is widely used in optoelectronic devices. For example: liquid crystal display (LCD), plasma display (PDP), electrode light emitting display (EL / OLED), touch screen, solar cell and other electronic instruments. [0003] At present, there are many preparation methods for ITO thin films, such as s...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/086C23C14/35
Inventor 谭华秦遵红王恋贵董安光
Owner LUOYANG KANGYAO ELECTRONICS
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