Manufacturing method and product of high-conductivity and low-reflectivity metal mesh

A metal grid, low reflectivity technology, applied in electrical digital data processing, data processing input/output process, instruments, etc. Long exposure time and other problems, to achieve the effect of reducing reflectivity, easy operation, and simple preparation process
CN104615304AActive Publication Date: 2015-05-13福建省诺希科技园发展有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
福建省诺希科技园发展有限公司
Publication Date
2015-05-13

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Abstract

The invention provides a manufacturing method of a high-conductivity and low-reflectivity metal mesh. The processing technologies of photoresist layer coating, embossing, plasma etching, metal mesh material plating and cleaning are adopted. The thickness of a photoresist layer is 20-60 microns, the photoresist layer is formed by two photoresist layer bodies with different etching rates in an overlaying mode, and the plasma etching rate of a photoresist material selected by the upper photoresist layer body is larger than the plasma etching rate of a photoresist material selected by the lower photoresist layer body. The plasma etching condition is that plasma power is 2000-3000 W, and the etching time is 2-30 minutes. The manufacturing method can be used for manufacturing the metal mesh with the width of an outgoing line being lower than 40 microns, and is suitable for manufacturing metal meshes which are made of all low resistance value metal materials such as gold, silver, copper and aluminium. In addition, the metal mesh which is manufactured by the method and is provided with a wide upper portion and a narrow lower portion has the advantages of being low in reflectivity and high in conductivity.
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Description

technical field

[0001] The invention belongs to the field of touch panel materials, in particular to a method for manufacturing a high-conductivity and low-reflectivity metal grid and a product thereof. Background technique

[0002] In the future, mobile terminals, wearable devices, smart home appliances and other products will have a strong demand for touch panels. At the same time, with the large size and low price of touch panels, and the traditional ITO film can not be used for flexible applications, the conductivity and light transmission Due to factors such as the difficulty of overcoming essential problems such as high efficiency, many panel manufacturers have begun to study alternatives to ITO, including materials such as nano-silver wires, metal grids, carbon nanotubes, and graphene. Among them, the metal grid is most widely used in the market because of its lowest cost and good electrical conductivity.

[0003] The traditional production process of metal mesh (Met...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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