Device and method for measuring multi-wavelength characteristic X ray diffraction

Abstract

The invention relates to a device and a method for measuring multi-wavelength characteristic X ray diffraction of an X ray diffraction spectrum of a measured crystal material sample by selecting a certain characteristic X ray of an X ray tube anode target within a relatively wide wavelength range. The device comprises an X ray tube, a high-pressure generator, a silt, an angle measurer, a detector, a multi-path analyzer, and the like. According to the device and the method disclosed by the invention, large-scale attenuation of the characteristic X ray diffraction due to use of a filter sheet or a crystal monochromator and the like is avoided; required characteristic X rays for measuring needed wavelength can be selected by regulating the tube voltage of the X ray tube and upper and lower thresholds of the multi-path analyzer, so that diffraction rays (characteristic X rays with relatively large wavelengths) on the surface of a sample can be measured in a nondestructive manner, and the diffraction rays (characteristic X rays with relatively small wavelengths) inside the sample can be measured in the nondestructive manner. Moreover, the device is simple and convenient to operate, relatively short in detection time; the characteristic X ray diffraction spectrums obtained by scanning are real and reliable.

Description

technical field [0001] The invention relates to a multi-wavelength characteristic X-ray diffraction measurement device and method using an X-ray tube with a metal or alloy anode target with a higher atomic number (Z) as a radiation source, especially a method for measuring the X-ray diffraction by adjusting the tube voltage of the X-ray tube and the upper and lower thresholds of the multi-channel analyzer, the detector can be used to arbitrarily select a certain wavelength characteristic X-ray required for measurement from the multiple characteristic X-rays covering a wide wavelength range emitted by the anode target of the X-ray tube, and the measurement is carried out A multi-wavelength characteristic X-ray diffraction measurement device and method for measuring the diffraction spectrum of a crystal material sample and performing X-ray diffraction analysis. Background technique [0002] X-ray diffraction analysis is mainly used to determine the crystal structure of materia...

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Problems solved by technology

[0005] At present, commonly used X-ray diffraction analysis instruments (such as D8 series X-ray diffractometer of BUKER company), commonly used X-ray tubes with Cu, Cr, Fe, Mo and other materials as anode targets, and X-ray tubes with a maximum tube voltage of 60KV The X-ray machine is used as the X-ray source, and the intensity of the characteristic X-rays is greatly attenuated due to the monochromization process using a filter or a crystal monochromator

Since the characteristic X-rays such as CrKα, FeKα, CuKα, and MoKα have longer wavelengths (0.07nm-0.3nm), the test depth is about 10 microns, and X-ray diffraction analysis can only be performed on the surface of the material sample or the sample to be tested.

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