Production method for drawing mold with nano-scale diamond coating on inner hole surface

Abstract

The invention relates to a production method for a drawing mold with a nano-scale diamond coating on the inner hole surface. The production method comprises: carrying out a chemical treatment on a substrate, directly placing the substrate into a CVD equipment reaction chamber, using a CVD vapor deposition method, carrying out nucleation for 0.5 h and carrying out a growth process for 6-7 h, etching graphite or inhibiting graphite growth by using H2 with a gas flow rate of 300-400 ml / min, adopting an acetone and methanol mixture with a gas flow rate of 5-10% as a carbon source according to a ratio of 1:1, depositing a layer of a diamond film on the mold inner hole surface, and adding Ar with a gas flow rate of 50-60% to the reaction gas 1-3 h before completing the growth process to dope. According to the diamond film growing through the deposition method in the present invention, the inner layer is the micro-scale film, the particles are coarse, and the bonding force is strong, while the outer layer is the nano-scale particles after the doping reaction, the particles are fine, and the hardness is high so as to easily polish.

Description

technical field [0001] The invention relates to the field of diamond coating production, in particular to the production of nanoscale diamond coating. Background technique [0002] At present, using the chemical vapor deposition method to make micron-scale coatings on the surface of the inner hole of the tungsten carbide wire drawing die with a cobalt content of less than 8% has basically matured. Because the properties of the diamond film grown by CVD method are similar to those of natural single crystal diamond, and the hardness is quite high, it is favored by the majority of users in the wire drawing industry. It is well known that obtaining a smooth surface is closely related to the smoothness and roughness of the inner hole of the mold. The smaller the roughness, the higher the smoothness of the inner hole of the mold, the smaller the resistance during the drawing process, and the smoother the surface of the drawn product. Especially in the compact aluminum conductor s...

AI Technical Summary

Problems solved by technology

Although this method also uses Ar ions for sputtering treatment, it is applied to the tool to deposit cubic boron nitride, and the Ar ions are used for sputtering treatment after the deposition of the diamond film is not for the purpose of depositing nano-sized diamonds. The latter has no technical inspiration, and cannot overcome the difficulty of polishing the inner hole of the mold existing in the current technology