Atom gas chamber inner wall coating method for slowing down atomic spin relaxation

A technology of atomic gas chamber and atomic spin, applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of increasing the uncontrollable risk, danger, and performance change of atomic gas chamber , to achieve the effects of increasing the macroscopic atomic spin relaxation time, optimizing the size of the connecting pipeline, and optimizing the coating process conditions

Active Publication Date: 2016-01-20
BEIJING INST OF AEROSPACE CONTROL DEVICES
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Problems solved by technology

In the above process, there are mainly the following problems. One is that the RbH coating is formed after the atomic gas chamber is sealed. Since the atomic gas chamber is in a sealed state during this process, the amount of free rubidium atoms in the atomic gas chamber decreases with the formation of the RbH film. At the same time, H in the gas chamber

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  • Atom gas chamber inner wall coating method for slowing down atomic spin relaxation

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Embodiment 1

[0043] First, clean and dry the six atomic gas chambers 3 glass bulbs, and then weld them on the glass main pipe 1 through six glass thin tubes 5, the diameter of the glass thin tubes 5 is 2.5 mm, and the diameter of the glass main pipe 1 is 20 mm. A 10 mg rubidium source is placed in a glass container 2 and welded to the glass main pipe 1 through a glass thin tube 6 with a diameter of 8 mm. Put 500mg of titanium hydride in the glass container 4, and weld it to the glass main pipe 1 through the glass thin tube 7, the diameter of the glass thin tube 7 is 8mm.

[0044] Connect the glass main pipe 1 to the vacuum system, and use a vacuum pump to evacuate the entire pipeline to a pressure of 3×10 -4 Pa; use the method of distillation to heat the glass container 2 holding the rubidium source, so that the rubidium source diffuses into each atomic gas chamber 3 in the form of steam; the heating temperature is 220°C.

[0045] Heat the glass container 4 containing the hydride solid ga...

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Abstract

The invention provides an atom gas chamber inner wall coating method for slowing down atomic spin relaxation. The method includes the steps that firstly, rubidium atom steam is injected into an atom gas chamber; then, hydrogen with the pressure intensity of 10 Torr to 100 Torr is released into the atom gas chamber through hydride solid gas release agents (such as titanium hydride and calcium hydride), the pressure intensity is kept for tens to hundreds of hours at the temperature 50 DEG C to 150 DEG C, and a layer of rubidium hydride thin film can be attached to the inner wall of the atom gas chamber; and finally, hydrogen left in the gas chamber is evacuated, and the coating process is finished. Hydrogen is generated through the solid gas release agents in the coating process; compared with a traditional method that a high-pressure hydrogen bottle is used as a hydrogen source, the process safety is improved when rubidium hydride coating is conducted on the inner wall of the atom gas chamber, and hydrogen left in the gas chamber after rubidium hydride coating is evacuated; and compared with the method for directly sealing hydrogen in the gas chamber, stability of performance of the atom gas chamber is easily improved.

Description

technical field [0001] The invention relates to the technical field of atomic gas chamber preparation, in particular to an atomic gas inner wall coating method for slowing down the relaxation of atomic spins. Background technique [0002] The atomic sensing gas chamber is the core physical component of atomic sensing instruments such as atomic inertial instruments, atomic clocks, and atomic magnetometers, and its performance parameters directly affect the performance of such sensing instruments. A typical atomic gas chamber uses optical glass to encapsulate alkali metal atoms such as rubidium and cesium in a vacuum or an inert gas atmosphere, and fills in a certain pressure of inert gas as a working gas and buffer gas. [0003] In the atomic gas chamber, while the atoms gain spin polarization, there is also a macroscopic spin loss process caused by the collision between the atoms and the inner wall of the gas chamber. The time from polarization to loss of atomic spin is cal...

Claims

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Application Information

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IPC IPC(8): C23C16/30
Inventor 李新坤王巍刘院省王学锋邢朝洋刘福民石猛邓意成王妍周维洋
Owner BEIJING INST OF AEROSPACE CONTROL DEVICES
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