Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Photosensitive resin composition for forming insulating film in organic el display element

A technology of photosensitive composition and photosensitive resin, which is applied in the direction of photosensitive materials used in opto-mechanical equipment, etc., can solve the problems of easy cracking and poor display of the functional layer, and achieve the effect of high water resistance

Active Publication Date: 2020-08-07
TOKYO OHKA KOGYO CO LTD
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In addition, when the functional layer is formed between the insulating films by evaporation or other methods, if the angle (cone angle) formed between the end surface of the insulating film and the bottom of the insulating film is too large, the functional layer is prone to cracks.
If cracks occur in the functional layer, poor display may occur due to the penetration of moisture etc. from the cracked part

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition for forming insulating film in organic el display element
  • Photosensitive resin composition for forming insulating film in organic el display element
  • Photosensitive resin composition for forming insulating film in organic el display element

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0160] □Preparation method of photosensitive resin composition□

[0161] The photosensitive resin composition can be prepared by mixing and stirring the above-mentioned components in a predetermined ratio, and then by a normal method. In addition, filtration may be further performed using a net, a membrane filter, or the like as necessary.

[0162] □How to form an insulating film□

[0163] The insulating film is formed by a method comprising: a coating step of forming a coating film of the photosensitive resin composition on a substrate; an exposure step of positionally selectively irradiating the coating film with active rays to expose; The development process of developing the coated film.

[0164] [Coating process]

[0165] In the coating step, the photosensitive resin composition is coated on a substrate for forming an EL display element having various functional layers as necessary, using a spin coater or the like to form a coating film. The film thickness of the coat...

Embodiment 1~11、 and comparative example 1~9

[0174] (resin component)

[0175] In Examples and Comparative Examples, the resins described in Table 1 below were used as the resin component (A) novolac resin or a substitute component of (A) novolac resin.

[0176] Among the resin components described in Table 1 below, as the cresol novolac resin, a resin prepared according to the following formulation was used.

[0177]

[0178] m-cresol and p-cresol, formaldehyde, and catalytic amount of oxalic acid in the ratios described in Table 1 were put into the reaction vessel. The contents of the reaction vessel were reacted under reflux conditions for 4 hours according to a conventional method to prepare a crude cresol novolak resin. Thereafter, the crude cresol novolak resin was heated under reduced pressure to remove low molecular weight components in the resin to obtain a cresol novolac resin. By adjusting the heating temperature and treatment time in the heating step under reduced pressure, the contents of monomers and di...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention provides a photosensitive resin composite, and an insulating film and a dike which are formed by using the photosensitive resin composite in an organic EL display element. The photosensitive resin composite can form an insulating film which is not excessively reduced even through the developing process and the baking process, and can preferably reduce the taper angle of the insulating film through short time of baking process and enable the insulating film to be high in water resistance, solvent resistance and heat resistance in the organic EL display element. For the photosensitive resin composite which contains A) novolac resin and B) sensitiser and is used for forming the insulating film in the organic EL display element, the mixed (C) corss-linking agent is provided with a (D) silane coupling agent with ethylene oxide or oxetane, and the content of the monomer in the A) novolac resin and the content of the biopolymer is 5-18% by quality relative to the quality of the A) novolac resin.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for forming an insulating film in an organic EL display element, an insulating film in an organic EL display element formed using the photosensitive resin composition, and an organic organic EL display element formed using the photosensitive resin composition. Banks in EL display elements. Background technique [0002] Organic EL display elements are self-luminous display elements, so compared with liquid crystal display elements, they have various advantages such as no viewing angle dependence, low power consumption, and excellent impact resistance, so they are being used in portable terminals. It is used in various display devices such as display devices and automotive display devices. [0003] In this organic EL display element, the pattern of the insulating film is formed for the purpose of single insulation, the purpose of separating and insulating various functional layers, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/008
Inventor 片野彰铃木茂青木知三郎
Owner TOKYO OHKA KOGYO CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products