Preparation method of three-dimensional structure CNTs reinforced Cu-based composite
A composite material and three-dimensional structure technology, applied in metal material coating process, gaseous chemical plating, coating, etc., can solve the problems of uneven dispersion of three-dimensional CNTs, low strength of composite materials, and low bonding force between CNTs and the matrix. Achieve good application prospects, improve strength, and facilitate industrial production
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specific Embodiment approach 1
[0022] Specific embodiment 1: The preparation method of a kind of three-dimensional structure CNTs reinforced Cu-based composite material described in this embodiment is specifically carried out according to the following steps:
[0023] 1. Place copper foam in acetone for ultrasonic pretreatment for 10-20 minutes to obtain pretreated copper foam;
[0024] 2. Place the pretreated foamed copper in a chemical vapor deposition device, evacuate until the pressure is below 20 Pa, feed argon gas with a gas flow rate of 5 sccm to 20 sccm, adjust the pressure in the chemical vapor deposition device to 100 Pa to 200 Pa, and Under the pressure of 100Pa~200Pa and argon atmosphere, the temperature is raised to 500℃~800℃;
[0025] 3. Feed methane gas, adjust the gas flow rate of methane gas to 1sccm~20sccm, adjust the gas flow rate of argon gas to 80sccm~99sccm, adjust the pressure in the chemical vapor deposition device to 400Pa~700Pa, and then adjust the pressure to 400Pa~700Pa and tempe...
specific Embodiment approach 2
[0036] Embodiment 2: This embodiment differs from Embodiment 1 in that: in step 5, the growth is carried out under the conditions of a pressure of 500 Pa to 800 Pa and a temperature of 500° C. to 700° C., and the holding time is 5 min to 25 min. Others are the same as in the first embodiment.
specific Embodiment approach 3
[0037] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is that in step six, the sintering pressure is 20MPa~50MPa, the current on-off time ratio is (1~8)ms:1ms and the sintering temperature Spark plasma sintering is carried out at 800°C to 1000°C for 2min to 5min. Others are the same as in the first or second embodiment.
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