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Multi-beam interference lithography method combining digital micromirror device and polygonal prism

A technology of digital micromirror equipment and multi-beam interference, which is applied in the direction of microlithography exposure equipment, optomechanical equipment, photoplate making process of pattern surface, etc., can solve the problem that the resolution is difficult to improve, and achieve simplified optical path and flexible optical The effect of field conditioning properties

Active Publication Date: 2017-09-29
UNIV OF SCI & TECH OF CHINA
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Problems solved by technology

It can be seen that due to the influence of gap diffraction between micro-mirrors and other reasons, its resolution is difficult to improve

Method used

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  • Multi-beam interference lithography method combining digital micromirror device and polygonal prism
  • Multi-beam interference lithography method combining digital micromirror device and polygonal prism
  • Multi-beam interference lithography method combining digital micromirror device and polygonal prism

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Embodiment Construction

[0018] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0019] An embodiment of the present invention provides a multi-beam interference lithography method that realizes the combination of a digital micromirror device and a polygonal prism; figure 1 Shown is the optical path structure to realize the method, figure 1 Among them, 1-448nm laser, 2-polarizer, 3-spatial filter, 4-mirror 1, 5-DMD, 6-beam expander, 7-mirror 2, 8-polygonal prism, 9 sample stage.

[0020] The process is as follows:

[0021] Th...

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Abstract

The invention discloses a multi-beam interference lithography method combining a digital micro-mirror device and a multifaceted prism. The method comprises the following steps that laser is emitted through a 448nm laser, the emitted laser is turned into linearly polarized light through a polarizer, is filtered to linearly polarized parallel light through a spatial filter and is reflected to the digital micro-mirror device DMD through a reflector 1, and the light emitted from the DMD is turned into parallel light which has the same shape as a pattern loaded on the DMD and is emitted into a beam expanding device; through the beam expanding device, the beam size is matched with the size of the lateral surface of the multifaceted prism, the beam is incident on the lateral surface of the multifaceted prism through a reflector 2, and each incident light is emitted after deflection of the multifaceted prism; through vertically moving a sample stage, multi-path rays of light emitted from the multifaceted prism are overlapped on photoresist in an interference manner, so that multi-beam interference lithography can be realized. According to the scheme, a multi-beam interference lithography light path is simplified without a large amount of beam splitters and reflectors, and meanwhile, the size of a written structure is far smaller than that of a direct-writing lithography structure of the DMD.

Description

technical field [0001] The invention relates to the technical field of multi-beam interference lithography, in particular to a multi-beam interference lithography method combining a digital micromirror device and a polygonal prism. Background technique [0002] Micro-nano processing technology and technology are the basis of microelectronics, integrated optoelectronics, micro-nano photonics research and related device fabrication. Electron beam etching, focused ion beam etching and other methods are common methods for processing subwavelength nanostructures, but their processing costs are high and efficiency is low, and it is difficult to meet the needs of large-area micro-nanostructure processing. Although the processing fineness of the optical writing method is limited by the optical diffraction limit, it has the advantages of low cost and high efficiency. It can prepare one-dimensional and two-dimensional micro-nano structures in large areas. It is suitable for spectral d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B26/08
CPCG02B26/0833G02B26/0883G03F7/2006G03F7/2008
Inventor 崔辰静鲁拥华王沛
Owner UNIV OF SCI & TECH OF CHINA
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