Post-processing method to enhance the damage threshold of fused quartz optical element

An optical element and damage threshold technology, applied in glass production and other directions, can solve problems such as reducing the damage threshold of components, and achieve the effects of increasing the damage threshold, preventing redeposition, and improving process stability

Active Publication Date: 2016-04-13
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The method of removing the subsurface defect layer by reactive ion etching is easy to bring new pollution sources to the components due to the use of a vacuum system, reducing the damage threshold of the components

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The size of the optical element to be processed is 50*50*5mm, the polishing method is mechanical polishing, the surface roughness is RQ value less than 1nm, and the fused silica material is Corning 7980. The specific processing steps are as follows.

[0032] Depth and lateral scale of defect distribution such as subsurface scratches and cracks in fused silica optical components detected by three-dimensional imaging with fluorescence confocal microscopy.

[0033] The fused silica optical element to be treated is placed in an inorganic acid solution for leaching. The composition of the inorganic acid solution is nitric acid and hydrogen peroxide at a ratio of 3:1, heated at 80°C, and treated for 5 cycles. In the process of mineral acid treatment, seven-frequency ultrasonic wave is used for auxiliary treatment, and the frequencies used are 40KHz, 80KHz, 120KHz, 140KHz, 170KHz, 220KHz, and 270KHz. The application time of different frequencies in each cycle is different, 40K...

Embodiment 2

[0046] The size of the optical element to be processed is 50*50*10mm, the polishing method is magnetorheological polishing, the surface roughness is RQ value less than 1nm, and the fused silica material is Corning 7980. The specific processing steps are as follows.

[0047] Depth and lateral scale of defect distribution such as subsurface scratches and cracks in fused silica optical components detected by three-dimensional imaging with fluorescence confocal microscopy.

[0048] The fused silica optical element to be treated is placed in a hydrofluoric acid solution, and the concentration of hydrofluoric acid is 10%. The solution was heated to 45 o c. Megasonic assisted etching is used in the hydrofluoric acid etching process. For 2 cycles of corrosion, the frequencies used are 430KHz and 1.3MHz, and the application time of different frequencies in each cycle is different, 430KHz is 10min, and 1.3MHz is 20min. The order of frequency of each cycle changes from small to large....

Embodiment 3

[0058] The size of the fused silica optical element to be processed is 430*430*20mm, and the surface roughness is RQ value less than 1nm. The specific processing steps are as follows.

[0059] Depth and lateral scale of defect distribution such as subsurface scratches and cracks in fused silica optical components detected by three-dimensional imaging with fluorescence confocal microscopy.

[0060]The fused silica optical element to be treated is placed in an inorganic acid solution for leaching. The composition of the inorganic acid solution is nitric acid and hydrogen peroxide at a ratio of 3:1, heated at 80°C, and treated for 5 cycles. In the process of mineral acid treatment, seven-frequency ultrasonic wave is used for auxiliary treatment, and the frequencies used are 40KHz, 80KHz, 120KHz, 140KHz, 170KHz, 220KHz, and 270KHz. The application time of different frequencies in each cycle is different, 40KHz, 80KHz, 120KHz is 2min, 140KHz, 170KHz, 220KHz, 270KHz is 5min, and the...

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Abstract

The invention discloses a post-processing method to enhance the damage threshold of a fused quartz optical element. First, a fluorescence confocal microtechnique is employed to detect the distribution scope and scale of subsurface defects of the fused quartz optical element; and multi-frequency ultrasonic alternating multiplexing assisted chemical etching technique through KHz and MHz frequencies is used for etching different depths according to subsurface defects in different depth distribution; different frequencies are used for different scales of subsurface defects to peel off the subsurface defects layer by layer, in order to enhance the damage threshold. The post-processing method has global processing capability on optical element; hydrofluoric acid corrosion treatment completely removes a polishing deposited layer to expose the scratches on the subsurface damage layer, and sharp new look of the scratches are well passivated; the introduction of multi-frequency ultrasonic / megasonic assist can act on scratch passivation at different scales to prevent re-deposition of the etching reaction byproducts and improve the process stability. The method can stably and greatly enhance the damage threshold of the fused quartz optical element.

Description

technical field [0001] The invention belongs to the technical field of optical element processing, and in particular relates to a method for increasing the damage threshold of fused silica optical elements. Background technique [0002] With the development of high-power laser technology, the working flux of high-power ultraviolet laser systems will gradually approach or even exceed the load limit of traditional fused silica optical components, which greatly limits the output capability of high-power laser systems. On the other hand, under high laser flux, the damage of fused silica optical components also greatly reduces the stability of the laser system and increases the operating cost of the system. Therefore, the laser-induced damage of the current fused silica optical components is the main short-board technology that limits the power output of laser systems. When the fused silica material is irradiated by laser, the material damage caused by high-energy laser depositi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00C03B25/00
CPCY02P40/57C03C15/00C03B25/00
Inventor 叶鑫蒋晓东黄进刘红婕孙来喜李青芝王凤蕊周晓燕耿锋
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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