Method for preparing micro-nano PSS (Patterned Sapphire Substrate) by photoetching of nano flexible film

Abstract

The invention relates to a method for preparing a micro-nano PSS (Patterned Sapphire Substrate) by photoetching of a nano flexible film. The method comprises the following steps: homogenizing glue: firstly, taking a sapphire substrate and uniformly coating a base layer of the sapphire substrate with one layer of photoresist; exposing: then, transferring the sapphire substrate to the lower side of the flexible film; enabling the soft film and the sapphire substrate to be in slight contact and carrying out exposure treatment; developing: moving the exposed sapphire substrate from the lower side of the flexible film, removing the exposed photoresist and remaining an unexposed part to realize pattern transferring; and etching: carrying out ICP etching treatment on the unexposed part of the photoresist so as to prepare the micro-nano PSS. The method provided by the invention has the advantages that when the method is used for preparing, the flexible film only needs to be in the slight contact with the photoresist, so that the pollution to the flexible film by the photoresist is effectively reduced and the service life of the flexible film is correspondingly prolonged; stepping type exposure does not need to be carried out and a whole wafer is molded in one step; and the method is suitable for preparing the large-size PSSs and the efficiency is relatively high.

Description

technical field [0001] The invention relates to the field of chip manufacturing, in particular to a method for preparing micro-nano PSS by photolithography of nano soft film. Background technique [0002] Light-emitting diode (LED) is a kind of electro-optic conversion, high efficiency and energy saving, green environmental protection, long life, etc. Solid-state lighting, which is expected to become a new generation of light source and enter thousands of households, will cause a revolution in the history of human lighting. Among them, the blue LED chip grown on the sapphire substrate with gallium nitride epitaxy is coated with yellow light phosphor, and the blue light excites the phosphor to emit yellow light. Blue light is mixed with yellow light to get white light, so blue LEDs are used to get white light. There are two common gallium nitride substrate materials, namely sapphire and silicon carbide. The poor machining performance of silicon carbide, high price and patent...

AI Technical Summary

Problems solved by technology

[0003] The preparation of micro-nano PSS includes the steps of uniform glue, exposure, development, etching, etc., but the traditional preparation method has the following disadvantages: the method of nanoimprinting is required for exposure, and this method requires the soft The film is in deep contact with the glue, and the soft film is generally made of resin, so it will cause the glue to pollute the soft film, and also reduce the service life of the soft film. Moreover, the traditional photolithography preparation method is not suitable for exposure time, energy, etc. The control of parameters is not very good, so step exposure is required, which leads to a long exposure time and low work efficiency

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