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Photosensitive corrosion-resistant nanomaterial and preparation method thereof

A nano-material and anti-corrosion technology, applied in the field of materials, can solve the problems of high thermal expansion coefficient, low photosensitivity, and insufficient precision of graphics, and achieve the effect of high thermal stability and strong sensitivity

Inactive Publication Date: 2016-05-25
SUZHOU JIEDERUI PRECISION MACHINERY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the currently used photoresist materials also have many disadvantages, such as low photosensitivity, high coefficient of thermal expansion, and insufficient precision of transferred patterns.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A photosensitive anti-corrosion nano material, prepared from the following components in parts by weight: 1 part of propylene glycol methyl ether acetate, 0.2 part of glycidyl methacrylate, 0.1 part of p-hydroxyanisole, and 0.2 part of stearic acid amide , 5 parts of tripropylene glycol diacrylate, 1 part of ethyl orthosilicate, 10 parts of ethylene glycol dimethacrylate, 1 part of tetraethoxysilane, 1 part of γ-chloropropyl trichlorosilane, γ -1 part of aminopropyltriethoxysilane, 2 parts of 1-hydroxycyclohexyl phenyl ketone, 1 part of isopropylthioxanthone, 0.1 part of citric acid, 0.2 part of β-cyclodextrin, absolute ethanol 20 parts, ammonia water 0.1 part, distilled water 10 parts.

[0024] The preparation method of the above-mentioned photosensitive anti-corrosion nano-material is as follows: first mix and stir ethyl orthosilicate, absolute ethanol, ammonia water and distilled water, heat to 50° C., add tetraethoxysilane dropwise and react for 23 hours to obtain m...

Embodiment 2

[0026] A photosensitive anti-corrosion nano material, prepared from the following components in parts by weight: 1.5 parts of propylene glycol methyl ether acetate, 0.3 parts of glycidyl methacrylate, 0.12 parts of p-hydroxyanisole, and 0.3 parts of stearic acid amide , 6 parts of tripropylene glycol diacrylate, 1.2 parts of ethyl orthosilicate, 12 parts of ethylene glycol dimethacrylate, 1.3 parts of tetraethoxysilane, 1.5 parts of γ-chloropropyl trichlorosilane, γ -1.2 parts of aminopropyltriethoxysilane, 2.2 parts of 1-hydroxycyclohexyl phenyl ketone, 1.2 parts of isopropylthioxanthone, 0.11 parts of citric acid, 0.25 parts of β-cyclodextrin, absolute ethanol 25 parts, ammonia water 0.12 parts, distilled water 12 parts.

[0027] The preparation method of the above-mentioned photosensitive anti-corrosion nano-material is as follows: first mix and stir ethyl orthosilicate, absolute ethanol, ammonia water and distilled water, heat to 55°C, add tetraethoxysilane dropwise and re...

Embodiment 3

[0029] A photosensitive anti-corrosion nano material, prepared from the following components in parts by weight: 2 parts of propylene glycol methyl ether acetate, 0.35 parts of glycidyl methacrylate, 0.15 parts of p-hydroxyanisole, and 0.35 parts of stearic acid amide , 7.5 parts of tripropylene glycol diacrylate, 1.5 parts of ethyl orthosilicate, 15 parts of ethylene glycol dimethacrylate, 1.5 parts of tetraethoxysilane, 2 parts of γ-chloropropyl trichlorosilane, γ -1.5 parts of aminopropyltriethoxysilane, 2.5 parts of 1-hydroxycyclohexyl phenyl ketone, 1.5 parts of isopropylthioxanthone, 0.15 parts of citric acid, 0.3 parts of β-cyclodextrin, absolute ethanol 30 parts, 0.15 parts of ammonia water, and 15 parts of distilled water.

[0030] The preparation method of the above-mentioned photosensitive anti-corrosion nano-material is as follows: first mix and stir ethyl orthosilicate, absolute ethanol, ammonia water and distilled water, heat to 55°C, add tetraethoxysilane dropwi...

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PUM

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Abstract

The invention provides a photosensitive corrosion-resistant nanomaterial and a preparation method thereof. The preparation method comprises the following steps: mixing and stirring tetraethylortho silicate, absolute ethyl alcohol, ammonia water and distilled water, heating the mixture and then dropwise adding tetraethoxysilane to obtain a mixture A; mixing and stirring gamma-chloropropyl trichlorosilane and gamma-aminopropyltriethoxysilane, and dropwise adding glycidyl methacrylate and p-Hydroxyanisole to obtain a mixture B; dripping the mixture B into the mixture A for reaction, adding octadecanamide, citric acid and beta-cyclodextrin for stirring, and then adding propylene glycol methyl ether acetate for rotary evaporation; and mixing and stirring 1-hydroxycyclohexylphenylketone, ethylene glycol dimethacrylate, isopropylthioxanthone and tripropylene glycol diacrylate, mixing all components and finally developing the solution on a copper-clad plate. The photosensitive corrosion-resistant nanomaterial provided by the invention has very high photosensitive parameters, very high photosensitivity, relatively low coefficient of thermal expansion and high thermal stability, and simultaneously has certain corrosion resistance.

Description

technical field [0001] The invention relates to the field of materials, in particular to a photosensitive anti-corrosion nanometer material and a preparation method thereof. Background technique [0002] Photosensitive materials refer to a class of functional materials in which photosensitive molecules can produce chemical and physical changes within or between molecules after absorbing light energy. Among the many photosensitive materials, the more mature and widely used materials mainly include photoresist materials and photoattraction materials, which have been widely used in many industries, such as polymer microfabrication and printed circuit board production. However, the currently used photoresist materials also have many disadvantages, such as low photosensitivity, high coefficient of thermal expansion, and insufficient precision of transferred patterns. Nanomaterials are relatively new and have developed rapidly in recent years. They have been studied and utilized ...

Claims

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Application Information

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IPC IPC(8): G03F7/027
CPCG03F7/027
Inventor 姚振红
Owner SUZHOU JIEDERUI PRECISION MACHINERY
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