Super graphene glass and its preparation method and application
A graphene and glass technology, applied in the field of materials, can solve the problems of reducing film quality and complicated procedures, and achieve the effect of avoiding damage
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Embodiment 1
[0050] Embodiment 1. Using quartz glass as a substrate, super graphene glass was prepared by atmospheric pressure thermal chemical vapor deposition (APCVD), demonstrating its biocompatible properties of supporting cell growth.
[0051] 1) The quartz glass disc substrate (radius 1.5cm, thickness 4mm) was ultrasonically cleaned (ultrasonic bath) in ultrapure water, isopropanol, acetone and ultrapure water for 5 minutes each, and the ultrasonic power of the ultrasonic bath was 80W. The quartz glass substrate after the ultrasonic bath was blown dry with high-purity nitrogen to obtain a quartz glass substrate, which was set aside.
[0052] 2) Put the quartz glass substrate obtained after cleaning into the APCVD cavity, and put Ar and H 2 The gas flow meters are set to 100sccm and 50sccm respectively, and the Ar and H 2 Valve, for scrubbing process, the purpose is to get rid of H in the reaction chamber 2 O and O 2 , and the duration is 10 minutes. After the gas scrubbing is com...
Embodiment 2
[0062] Example 2. Using ordinary white glass as a substrate, graphene glass was prepared by molten-state APCVD, and its conductive properties were demonstrated.
[0063] 1) According to the method in step 1 of Example 1, replace the quartz glass with common white glass (both length and width are 5 cm, and the thickness is 4 mm), to obtain a clean common white glass substrate.
[0064] 2) Put the ordinary white glass substrate obtained after cleaning into a cube graphite crucible, then put the crucible into an APCVD cavity, and put Ar and H 2 The gas flow meters are set to 150sccm and 20sccm respectively, and the Ar and H 2 Valve, for scrubbing process, the purpose is to get rid of H in the reaction chamber 2 O and O 2 , and the duration is 10 minutes. After the gas washing is completed, the air pressure of the APCVD chamber is 1 atmosphere, and the ordinary white glass substrate is heated up to 1000°C, and Ar and H are kept during the heating process. 2 The flow rate does ...
Embodiment 3
[0070] Example 3. Using ordinary white glass as a substrate, graphene glass was prepared by plasma-enhanced chemical vapor deposition (PECVD), and its surface hydrophobicity was demonstrated.
[0071] 1) According to the method in Step 1 of Example 1, replace the quartz glass with common white glass (3 cm in length, 1 cm in width, and 4 mm in thickness) to obtain a clean common white glass substrate.
[0072] 2) Put the ordinary white glass obtained after cleaning as the substrate into the PECVD chamber, evacuate to 1Pa, and pass CH 4 Gas (5.5sccm), ordinary white glass substrate is heated up to 600°C, and the pressure of the controlled gas does not exceed 40Pa. When the system is stable, turn on the plasma power supply of 80W and react for 1 hour. Methane ionizes and cracks into active groups. The active groups on the surface of the substrate at 600°C react, carbon and carbon form bonds, and graphene grows directly. After the reaction is completed Turn off the plasma power s...
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