M/MOx composite hydrogen resistance coating and preparation method thereof
A composite coating and hydrogen blocking technology, applied in coatings, chemical instruments and methods, metal material coating processes, etc., can solve the problems of high cost, complex preparation process, long time consumption, etc., to improve efficiency and simplify the preparation process. , The effect of improving the bonding force of the membrane substrate
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[0026] Example 1:
[0027] The transition layer and the hydrogen barrier coating are prepared by adopting conventional sputtering equipment and adopting reactive sputtering combined with negative bias technology.
[0028] 1) The 316L stainless steel substrate is ultrasonically cleaned with acetone and alcohol for 10 minutes, and then placed in the vacuum chamber.
[0029] 2) The background vacuum reaches 7×10 -3 After Pa, the substrate was cleaned with a bias voltage, the negative bias voltage was -200V, the Ar gas pressure was 1 Pa, and the cleaning time was 10 minutes.
[0030] 3) The Al transition layer was prepared by DC reactive sputtering combined with negative bias technology, the sputtering current was 10A, the sputtering power was 3300W, the negative bias was -200V, the pressure was 1Pa, and the deposition was 15min.
[0031] 4) Using DC reactive sputtering combined with negative bias technology to prepare Al in situ on the Al transition layer 2 O 3 Hydrogen barrier coating. A...
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[0033] Example 2:
[0034] The transition layer and the hydrogen barrier coating are prepared by adopting conventional sputtering equipment and adopting reactive sputtering combined with negative bias technology.
[0035] 1) The 304 stainless steel substrate is ultrasonically cleaned with acetone and alcohol for 10 minutes, and then placed in the vacuum chamber.
[0036] 2) The background vacuum reaches 5×10 -3 After Pa, clean the substrate with a bias voltage, the negative bias voltage is -50V, the Ar gas pressure is 2 Pa, and the cleaning time is 20 minutes.
[0037] 3) The Er transition layer was prepared by radio frequency reactive sputtering combined with negative bias technology, sputtering power was 1050W, negative bias was -50V, pressure was 0.5Pa, and deposited for 10 minutes.
[0038] 4) Prepare Er in situ on the Er transition layer by radio frequency reactive sputtering combined with negative bias technology 2 O 3 Hydrogen barrier coating. Ar / O 2 The ratio is 10 / 3, the press...
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