Copper-sulphur separation and ore dressing method for high-sulphur copper ores
A technology of copper-sulfur separation and beneficiation method is applied in the field of copper and sulfur separation of high-sulfur copper ores, and the beneficiation of high-sulfur copper ores, and can solve the problems of unsatisfactory separation effect, adverse environmental impact, difficult production control and the like, Achieve significant effect of energy saving and consumption reduction, improve grade and recovery rate, and reduce the effect of processing capacity
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0024] In order to further describe the present invention, a copper-sulfur separation and beneficiation method for high-sulfur copper ore of the present invention will be described in more detail below in conjunction with the accompanying drawings.
[0025] The raw ore adopted in the embodiment is the high-sulfur copper ore of a certain non-ferrous metal mine. The raw ore contains 0.94% copper and 12.53% sulfur. The sulfur minerals are pyrrhotite and pyrite. Pyrite accounts for 17.57%, and pyrite accounts for 6.90%. It is a high-sulfur, difficult-to-select copper and pyrite composite ore.
[0026] Depend on figure 1 The principle process flow chart of the copper-sulfur separation ore dressing method of a kind of high-sulfur copper ore of the present invention shown, the copper-sulfur separation ore dressing method of a kind of high-sulfur copper ore of the present invention comprises following technology, step:
[0027] (1) The high-sulfur copper ore is ground-classified, and...
PUM
Property | Measurement | Unit |
---|---|---|
Magnetic induction | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com