Preparation method of boron nitride composite polishing solution

Abstract

The invention discloses a preparation method of a boron nitride composite polishing solution. The preparation method is characterized in that by mass, 28-38% of water, 18-26% of ammonium dichromate, 12-20% of zirconium oxychloride and 24-32% of nano boron nitride are added to a grinding machine, the grinding machine is started, and a BN-Cr2O3-ZrO2 compound is prepared through grinding, drying and calcining; by mass, 70-78% of water, 2.0-4.0% of lignosulfonate, 3.0-5.0% of isopropyl alcohol, 1.0-5.0% of potassium bromate and 14-22% of BN-Cr2O3-ZrO2 compound are added to a reactor, a stirring reaction is conducted for 4-6 h at the rotating speed of 300 r/min, and the boron nitride composite polishing solution is obtained. The preparation process is simple, conditions are easy to control, the production cost is low, and industrial production is easy. In the polishing process, the advantages of being good in liquid polishing effect, free of scratches, high in flatness, small in dosage, resistant to abrasion and easy to wash are achieved.

Description

technical field [0001] The present invention relates to the technical field of preparation of a polishing liquid, in particular to a preparation method of a boron nitride composite polishing liquid [0002] And used in the polishing of disk substrates and magnetic heads. Background technique [0003] The disk substrate is generally made of aluminum-magnesium alloy or glass material. With the rapid development of the computer industry, especially with the rapid increase in the storage density of computer disks, the magnetic head is required to read smaller and weaker signals. Therefore, the magnetic head and The distance between the disk media is further reduced to increase the strength of the output signal. At present, the gap between the magnetic head and the magnetic disk has been reduced to about 10nm. The surface roughness, scratches and impurity particles of the magnetic head and magnetic disk will cause fatal damage to the computer magnetic disk. It is expected that ...

AI Technical Summary

Problems solved by technology

[0006] The traditional chemical mechanical polishing (CMP) technology is an important means of computer hard disk processing at present. It realizes the removal of materials and the flattening of the workpiece surface under the combination of chemical and mechanical effects. Although the material removal rate of the workpiece is high, the polishing process Due to the high hardness of nano-abrasive particles, easy agglomeration, and poor dispersion, the surface of the workpiece is prone to damage such as dents, corrosion, micro-scratches, and particle residues. However, it cannot well meet the current requirements for the surface smoothing process of atomic-level materials on the surface of hard disks.

[0007] The existing polishing liquid is acidic and corrosive to a certain extent. It is easy to damage the edge of the computer hard disk when it is applied to the computer hard disk, and it is easy to affect the life of the polishing machine.