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Preparation method of orientation magnetic films

A magnetic thin film and orientation technology, applied in the application of magnetic film to substrate, inductance/transformer/magnet manufacturing, evaporation application, etc., can solve the problem that it is difficult to form effective magnetization, and achieve the effect of convenient control

Inactive Publication Date: 2016-09-07
CHINA JILIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] For thin film materials, it is difficult to form effective magnetization due to the influence of shape anisotropy and the strong demagnetization field in the direction perpendicular to the film surface.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] The steps of the present invention are:

[0054] 1) Substrate substrate cleaning

[0055] This experiment uses the RCA standard chemical cleaning process to clean the substrate;

[0056] 2) Sample installation and magnetic field generation

[0057] Fix the target and the clean substrate substrate on the corresponding sample holder, adjust the distance between the substrate and the target, and separate the substrate and the target with a baffle plate; fix the neodymium iron boron permanent magnet to the substrate substrate The reverse side of the film; close the vacuum chamber and tighten the valve;

[0058] The function of the permanent magnet is to provide a magnetic field during the subsequent film growth process;

[0059] 3) Vacuum system

[0060] Turn on the power, turn on the mechanical pump and molecular pump cooling water, when the system vacuum reaches 0.2 Torr, the computer will control the molecular pump to automatically turn on;

[0061] 4) Laser preheating and pre-sputt...

Embodiment 2

[0073] The steps of the present invention are:

[0074] 1) Substrate substrate cleaning

[0075] This experiment uses the RCA standard chemical cleaning process to clean the substrate;

[0076] 2) Sample installation and magnetic field generation

[0077] Fix the target and the clean substrate substrate on the corresponding sample holder, adjust the distance between the substrate and the target, and separate the substrate and the target with a baffle plate; fix the substrate substrate with the strontium ferrite permanent magnet The reverse side of the film; close the vacuum chamber and tighten the valve;

[0078] The function of the permanent magnet is to provide a magnetic field during the subsequent film growth process;

[0079] 3) Vacuum system

[0080] Turn on the power, turn on the mechanical pump and molecular pump cooling water, when the system vacuum reaches 0.2 Torr, the computer will control the molecular pump to automatically turn on;

[0081] 4) Laser preheating and pre-sputte...

Embodiment 3

[0093] The steps of the present invention are:

[0094] 1) Substrate substrate cleaning

[0095] This experiment uses the RCA standard chemical cleaning process to clean the substrate;

[0096] 2) Sample installation and magnetic field generation

[0097] Fix the target material and the clean substrate substrate on the corresponding sample holder, adjust the distance between the substrate and the target material, and separate the substrate and the target material with a baffle plate; fix the samarium cobalt permanent magnet to the substrate substrate The reverse side; close the vacuum chamber and tighten the valve;

[0098] The function of the permanent magnet is to provide a magnetic field during the subsequent film growth process;

[0099] 3) Vacuum system

[0100] Turn on the power, turn on the mechanical pump and molecular pump cooling water, when the system vacuum reaches 0.2 Torr, the computer will control the molecular pump to automatically turn on;

[0101] 4) Laser preheating and...

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PUM

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Abstract

The invention relates to a preparation method of orientation magnetic films. The method adopts a laser pulse deposition method; and phase structures of the films are controlled through controlling a magnetic field on a substrate, a deposition temperature and a nitrogen pressure to obtain a series of iron nitride films consisting of different phases. The method can prepare the iron nitride films at low temperature, facilitates integrated application of film devices, and adopts a magnetic field inducing method to generate the crystallography orientation in growth of the films so as to conveniently control crystallography easy-magnetized shafts of the films.

Description

Technical field [0001] The invention relates to a method for preparing oriented magnetic film by laser pulse deposition, which belongs to the field of material preparation. Background technique [0002] Due to its excellent magnetic properties, high corrosion resistance and wear resistance, the iron-nitrogen magnetic film has a huge application prospect in the field of magnetic thin film devices. At present, Fe-N magnetic films with specific structures can be successfully prepared by various film preparation methods such as molecular beam epitaxy, ion implantation and magnetron sputtering. The inventor also used a pulsed laser deposition (PLD) method to prepare iron-nitrogen films. By introducing reactive gas into the vacuum chamber, PLD technology is beneficial to the preparation of a variety of complex oxide and nitride films, and it can also obtain certain room temperature non-equilibrium solid solutions or compounds. [0003] γ’-Fe 4 N material has been proved to have extreme...

Claims

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Application Information

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IPC IPC(8): C23C14/28C23C14/06H01F41/20
CPCC23C14/0021C23C14/0641C23C14/28H01F41/205
Inventor 张敖彭晓领李静杨艳婷徐靖才王攀峰金顶峰金红晓洪波王新庆葛洪良
Owner CHINA JILIANG UNIV
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