Method for recycling waste photoresist stripper

A stripper and photoresist technology, which is applied in the field of recycling waste photoresist strippers, can solve problems such as costing a lot of time and money, difficult additives, and reduced process efficiency

Active Publication Date: 2020-02-07
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, significant time and money are spent and process efficiency is reduced for recovering the relevant raw materials, analyzing the recovered material and diluting additives in solvents
In addition, in the process of diluting the additive in a solvent and adding the additive, significant differences can occur, so there is a limitation that it is difficult to quantitatively introduce the additive

Method used

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  • Method for recycling waste photoresist stripper
  • Method for recycling waste photoresist stripper
  • Method for recycling waste photoresist stripper

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1 to 20

[0064]

[0065] Fresh stripper liquids having the composition shown in Table 1 below were used in the electronic component manufacturing process. Solids were removed from the resulting spent photoresist stripper using a multi-stage distillation column at a temperature of 150° C. and a pressure of 100 Torr. Thereafter, the lower part of the multistage distillation column was maintained at a temperature of 150°C and a pressure of 100 Torr, and the upper part of the multistage distillation column was maintained at a temperature of 100°C and a pressure of 30 Torr to remove low-boiling point mixtures. Then, the lower portion of the multi-stage distillation column was maintained at a temperature of 150° C. and a pressure of 100 Torr, and the upper portion of the multi-stage distillation column was maintained at a temperature of 130° C. and a pressure of 100 Torr to remove high boiling point mixtures. A purified stripper liquid having the composition shown in Table 2 below was thus...

preparation example 21

[0072]

[0073] A recovered liquid having the composition shown in Table 3 below was prepared.

[0074] 【table 3】

[0075] Composition of recovered liquid

[0076] Imidazolyl-4-ethanol (wt%) 38.5 (2-aminoethoxy)-1-ethanol (wt%) 12.8 Diethylene glycol monobutyl ether (wt%) 42.3 [[(Methyl-1H-benzotriazol-1-yl)methyl]imino]bisethanol (wt%) 3.8 Benzimidazole(wt%) 1.9 Polyether modified siloxane (wt%) 0.7

Embodiment 1 to 20

[0077]

[0078] The purified stripping agent liquid obtained in Preparation Example 1 to Preparation Example 20, the recovery liquid obtained in Preparation Example 21, N-methylformamide, and diethylene glycol monobutyl ether were mixed in the weight ratio shown in Table 4 below. Place in a stirrer and stir at room temperature for 45 minutes to obtain a recovered stripper having the composition shown in Table 5 below.

[0079] 【Table 4】

[0080] Mixing ratio of purified stripping agent liquid, recovery liquid, N-methylformamide and diethylene glycol monobutyl ether

[0081]

[0082] 【table 5】

[0083] Composition of recycled stripper

[0084]

[0085] *IME: imidazolyl-4-ethanol

[0086] *AEE: (2-Amino-ethoxy)-1-ethanol

[0087] *NMF: N-methylformamide

[0088] *BDG: Diethylene glycol monobutyl ether

[0089] *First corrosion inhibitor: [[(methyl-1-benzotriazol-1-yl)methyl]imino]bisethanol

[0090] *Second corrosion inhibitor: benzimidazole

[0091] *Surfactant:...

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Abstract

The present invention relates to a regeneration method for stripping wastewater for a photoresist, the method comprising a step for having purifying fluid of stripping wastewater for a photoresist come in contact with a regeneration solution which comprises 40-75 wt % of one or more amine compounds, 20-55 wt % of an alkylene glycol compound, and 1-10 wt % of an additive.

Description

[0001] Cross references to related patent applications [0002] This application claims priority over Korean Patent Application No. 10-2014-0108635 filed with KIPO on Aug. 20, 2014 and Korean Patent Application No. 10-2015-0097659 filed with KIPO on Jul. 9, 2015 rights and interests, the entire content of said patent application is incorporated herein by reference. technical field [0003] The invention relates to a method for recycling waste photoresist stripper. In particular, the present invention relates to a method for recycling waste photoresist strippers that can shorten the analysis time of raw materials and the dilution time of additives, thereby increasing productivity and reducing costs, and can also quantitatively introduce raw materials and additives, thereby reducing recycling Content variation between ex-fresh photoresist stripper and recycled photoresist stripper. Background technique [0004] The manufacture method of the microcircuit of liquid crystal dis...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 朴泰文郑大哲李东勋李佑然李贤浚金周永
Owner LG CHEM LTD
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