Electromagnetic shielding function primitive material preparation method
A functional base unit and electromagnetic shielding technology, which is applied in the field of shielding material preparation, can solve the problems of unsatisfactory low-frequency shielding effectiveness, lower material mechanical properties, narrow electromagnetic shielding frequency band, etc., and achieve good shielding effect, low raw material cost, and electromagnetic shielding The effect of wide band
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example 1
[0018] First, weigh 20g of rice husk and crush it, pass through a 300-mesh sieve to obtain rice husk powder, add the rice husk powder to a beaker, add 200mL of hydrochloric acid solution with a mass concentration of 0.1mol / L, soak for 14h, filter, and obtain the filter residue For silicon oxide particles, add silicon oxide particles to 200mL sodium hydroxide solution with a mass concentration of 0.5mol / L, stir for 2 hours, then add 200mL of hydrochloric acid solution with a mass concentration of 1mol / L, stir for 3 hours, and filter to obtain Filter residue, put the filter residue in a muffle furnace, calcinate at 700°C for 4h, and then naturally cool to room temperature to obtain nano-silica; add the above-prepared nano-silica into a three-necked flask, and then add 200mL of 0.1mol / L ferric nitrate solution, 5g silicon carbide, 20mL polyethylene glycol, stir for 20min, then add 10g zinc powder in sequence, stir for 3h, put the reactant in a vacuum oven and dry for 3h, put the d...
example 2
[0020]First, weigh 10g of rice husk and crush it, pass through a 200-mesh sieve to obtain rice husk powder, add the rice husk powder to a beaker, then add 100mL of hydrochloric acid solution with a mass concentration of 0.1mol / L to soak for 12h, filter, and obtain the filter residue For silicon oxide particles, add silicon oxide particles to 100 mL of sodium hydroxide solution with a mass concentration of 0.5 mol / L, stir and react for 1 hour, then add 100 mL of hydrochloric acid solution with a mass concentration of 1 mol / L, stir and react for 2 hours, and filter to obtain Filter residue, put the filter residue in a muffle furnace, calcinate at 600°C for 3h, and then cool naturally to room temperature to obtain nano-silica; add the above-prepared nano-silica into a three-necked flask, and then add 100mL of 0.1mol / L ferric nitrate solution, 3g silicon carbide, 10mL polyethylene glycol, stir for 10min, then add 5g zinc powder in turn, stir for 2h, put the reactant in a vacuum ove...
example 3
[0022] First, weigh 15g of rice husk and crush it, pass through a 250-mesh sieve to obtain rice husk powder, add the rice husk powder to a beaker, then add 150mL of hydrochloric acid solution with a mass concentration of 0.1mol / L and soak for 13h, filter, and obtain the filter residue For silicon oxide particles, add silicon oxide particles to 150 mL of sodium hydroxide solution with a mass concentration of 0.5 mol / L, stir for 1 hour, then add 150 mL of hydrochloric acid solution with a mass concentration of 1 mol / L, stir for 2 hours, and filter to obtain Filter residue, put the filter residue in a muffle furnace, calcinate at 650°C for 3h, and then cool naturally to room temperature to obtain nano-silica; add the nano-silica prepared above into a three-necked flask, and then add 150mL of 0.1mol / L ferric nitrate solution, 4g silicon carbide, 15mL polyethylene glycol, stir for 15min, then add 7g zinc powder in turn, stir for 2h, put the reactant in a vacuum oven and dry for 3h, ...
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