Testing method of crystalline silicon solar cell diffusion dead layer
A solar cell and diffusion dead layer technology, which is applied in the field of solar cells, can solve the problems of low conversion efficiency of cells and low lifetime of minority carriers, and achieve the effects of simple test methods, good compatibility, and easy methods
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Embodiment 1
[0036] A method for testing the diffusion dead layer of a crystalline silicon solar cell, comprising the steps of:
[0037] (1) After the P-type silicon wafer to be tested is subjected to phosphorus diffusion junction and phosphorus-silicate glass layer removal, the four-probe method is used to test its sheet resistance, which is recorded as R1;
[0038] (2) Carry out heat treatment to the silicon chip of step (1), activate its doped dead layer;
[0039] The heat treatment is as follows: in a mixed atmosphere of nitrogen and argon, put the silicon wafer in step (1) into a furnace tube for heat treatment at a temperature of 1000° C. and an activation time of 5 minutes;
[0040] (3) adopt the four-probe method to test the sheet resistance of the silicon wafer in step (2) again, and denote it as R2;
[0041] (4) When R1>R2 and (R1-R2) / R1≥3%, it is determined that the crystalline silicon solar cell has a diffusion dead layer, and the concentration of impurity atoms in the diffusi...
Embodiment 2
[0043] A method for testing the diffusion dead layer of a crystalline silicon solar cell, comprising the steps of:
[0044] (1) After the P-type silicon wafer to be tested is subjected to phosphorus diffusion junction and phosphorus-silicate glass layer removal, the four-probe method is used to test its sheet resistance, which is recorded as R1;
[0045] (2) Carry out heat treatment to the silicon chip of step (1), activate its doped dead layer;
[0046] The heat treatment is as follows: 532 nm laser is used for thermal activation, the laser pulse width is 50 ns, and the laser power is 1.5J / cm 2 ;
[0047] (3) adopt the four-probe method to test the sheet resistance of the silicon wafer in step (2) again, and denote it as R2;
[0048] (4) When R1>R2 and (R1-R2) / R1≥3%, it is determined that the crystalline silicon solar cell has a diffusion dead layer, and the concentration of impurity atoms in the diffusion dead layer and the concentration of impurity atoms in the doped laye...
Embodiment 3
[0050] A method for testing the diffusion dead layer of a crystalline silicon solar cell, comprising the steps of:
[0051] (1) After the P-type silicon wafer to be tested is subjected to phosphorus diffusion junction and phosphorus-silicate glass layer removal, the electrochemical capacitance-voltage method is used to test the distribution of diffused impurities, and the impurity concentration at 0.15 microns is recorded, which is recorded as C1;
[0052] (2) Carry out heat treatment to the silicon chip of step (1), activate its doped dead layer;
[0053] The heat treatment is as follows: in a mixed atmosphere of nitrogen and argon, put the silicon wafer in step (1) into a furnace tube for heat treatment at a temperature of 1000° C. and an activation time of 5 minutes;
[0054] (3) Use the electrochemical capacitance-voltage method to test the distribution of diffused impurities again, record the impurity concentration at 0.15 microns, and record it as C2;
[0055] (4) When C1...
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