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A silver-introduced hafnium nitride film high infrared reflective durable material

A hafnium nitride film and infrared reflection technology, which is applied in metal material coating process, sputtering plating, ion implantation plating, etc., can solve the problems of low melting point, easy corrosion, no high durability and high infrared reflection, poor durability to achieve excellent durability and good infrared reflectivity

Inactive Publication Date: 2018-09-11
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The rapid development of modern technology has led to extremely high requirements for reflective coating materials for exposed infrared optical devices (such as optical mirrors), not only must have high infrared reflectivity, but also have high durability (high hardness, wear resistance, corrosion resistance), the mirror coating currently used does not have the excellent properties of high durability and high infrared reflection to some extent, taking the most commonly used reflective coating aluminum as an example, it has extremely high Infrared reflectivity, but it also has poor environmental durability such as low hardness, low melting point and easy corrosion; take reflective coating silver as an example, which has better infrared reflection performance and corrosion resistance than aluminum, but the same It has the disadvantages of low hardness, poor friction and wear resistance, and because the price of pure silver is relatively high, its cost as a mirror coating is also relatively high; in recent years, researchers at home and abroad have tried to plate a dielectric protective film ( SiO 2 etc.) to improve the durability of pure metal infrared mirror coatings, but the results are not ideal, and the process of synthesizing thin films is complex

Method used

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  • A silver-introduced hafnium nitride film high infrared reflective durable material

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Embodiment 1

[0024] A silver-introduced hafnium nitride film high infrared reflective durable material, the material is HfN-Ag composed of HfN and Ag x The film, wherein the content of Ag is 3.5 at.%.

[0025] The preparation method of the novel silver-introduced hafnium nitride film high-infrared reflective durable material of this embodiment is as follows: (1) select a silicon wafer as a substrate, and ultrasonically clean it in acetone, ethanol, and deionized water for 20 minutes each; (2) Put the pure Hf target and Ag target into the magnetron sputtering chamber, adjust the base distance of the target to 70mm, and evacuate to 4×10 -4 Pa, the substrate is heated up to 200°C, the pure Hf target adopts a DC power supply, and the sputtering power is set to 150W, and the pure Ag target adopts an RF power supply, and the sputtering power is set to 60W; (3) the N 2 gas and Ar gas, N 2 The gas flow rate is 2.8sccm, the Ar gas flow rate is 80sccm, the working pressure and bias voltage are 1.0...

Embodiment 2

[0027] A silver-introduced hafnium nitride film high infrared reflective durable material, the material is HfN-Ag composed of HfN and Ag x film, wherein the content of Ag is 3.1 at.%.

[0028] The preparation method of the novel silver-introduced hafnium nitride film high-infrared reflective durable material in this embodiment is as follows: (1) select a glass substrate as the substrate, and ultrasonically clean it in acetone, ethanol, and deionized water for 20 minutes each; (2) Put the pure Hf target and Ag target into the magnetron sputtering chamber, adjust the base distance of the target to 70mm, and evacuate to 4×10 -4 Pa, the substrate is heated up to 200°C, the pure Hf target adopts a DC power supply, and the sputtering power is set to 150W, and the pure Ag target adopts an RF power supply, and the sputtering power is set to 50W; (3) N 2 gas and Ar gas, N 2 The gas flow rate is 2.8sccm, the Ar gas flow rate is 80sccm, the working pressure and bias voltage are 1.0Pa a...

Embodiment 3

[0030] A silver-introduced hafnium nitride film high infrared reflective durable material, the material is HfN-Ag composed of HfN and Ag x film, wherein the content of Ag is 0.8 at.%.

[0031] The preparation method of the novel silver-introduced hafnium nitride film high-infrared reflective durable material in this embodiment is as follows: (1) select a glass substrate as the substrate, and ultrasonically clean it in acetone, ethanol, and deionized water for 20 minutes each; (2) adjust The base distance of the target is 70mm, put the pure Hf target and the Ag target into the magnetron sputtering chamber, and evacuate to 4×10 -4 Pa, the substrate is heated up to 200°C, the pure Hf target adopts a DC power supply, and the sputtering power is set to 150W, and the pure Ag target adopts an RF power supply, and the sputtering power is set to 20W; (3) N 2 gas and Ar gas, N 2 The gas flow rate is 2.8sccm, the Ar gas flow rate is 80sccm, the working pressure and bias voltage are 1.0...

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Abstract

The invention provides a novel silver-introduced hafnium-nitride-membrane high-infrared-reflection durable material and relates to the field of infrared reflection membrane materials. The material is a HfN-Agx membrane formed by HfN and Ag, the HfN-Agx membrane has a solid solution structure comprising HfN and Ag, and the content of Ag is 0.8-3.8at.%. A preparation method of the durable material includes: selecting a silicon wafer or a glass substrate to use as the substrate, placing a Hf target and a Ag target into a magnetic control sputtering chamber, vacuumizing, setting magnetic control sputtering parameters, feeding N2 and Ar gas, and depositing the HfN-Agx membrane onto the substrate. The durable material is good in infrared reflection performance and excellent in durability, can be hopefully used as the high-infrared-reflection durable membrane in harsh environments with high-speed solid-liquid particle impact, high temperature and corrosive liquid and gas, and can also be applied to the surface of an optical reflection device.

Description

technical field [0001] The invention relates to the field of infrared reflection film materials, in particular to a silver-introduced hafnium nitride film high infrared reflection durable material. Background technique [0002] The rapid development of modern technology has led to extremely high requirements for reflective coating materials for exposed infrared optical devices (such as optical mirrors), not only must have high infrared reflectivity, but also have high durability (high hardness, wear resistance, corrosion resistance), the mirror coating currently used does not have the excellent properties of high durability and high infrared reflection to some extent, taking the most commonly used reflective coating aluminum as an example, it has extremely high Infrared reflectivity, but it also has poor environmental durability such as low hardness, low melting point and easy corrosion; take reflective coating silver as an example, which has better infrared reflection perfo...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/08C23C14/35C23C14/06
CPCC23C14/0641C23C14/352G02B5/0808
Inventor 胡超权刘健郑伟涛
Owner JILIN UNIV
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