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Method for assisting high-temperature laser brazing through self-propagating reaction of nano-multilayer film

A nano-multilayer, laser-assisted technology, applied in welding equipment, welding equipment, manufacturing tools, etc., to achieve the effect of reducing requirements, reducing heat-affected zone, and increasing joint area

Inactive Publication Date: 2017-05-24
BEIJING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The purpose of the present invention is to solve the deficiencies of the existing dissimilar material laser brazing connection technology

Method used

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  • Method for assisting high-temperature laser brazing through self-propagating reaction of nano-multilayer film
  • Method for assisting high-temperature laser brazing through self-propagating reaction of nano-multilayer film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] 1) The silicon substrate was ultrasonically cleaned in alcohol and pure water for 5 min, respectively. Wash and dry.

[0033] 2) Magnetron sputtering is used to deposit nanometer multilayer films of Ti and Ni on the substrate. The process parameters of magnetron sputtering deposition: the deposition power is 250W, the Ar gas flow is 40sccm, the working pressure is 0.5Pa, and the background vacuum is 5*10 -4 Pa. The deposition time of Ti is 60s and that of Ni is 45s. Alternate deposition for 400 cycles. The thickness of the obtained multilayer film was about 24 μm.

[0034] 3) The deposited multilayer film is peeled off from the silicon substrate.

[0035] 4) The peeled multilayer film is placed between two layers of 30 μm thick SnAgCu solder foil to form a composite intermediate layer.

[0036] 5) Surface pretreatment of the base metal to be welded, using #200 sandpaper, #400 sandpaper, #600 sandpaper, #800 sandpaper and #1000 sandpaper to polish layer by layer un...

Embodiment 2

[0042] The difference between this embodiment and the first embodiment is that the magnetron sputtering is used to deposit the nanometer multilayer film of Ti and Al in the second step. The process parameters of magnetron sputtering deposition: the deposition power is 200W, the deposition time of Ti is 70s, the deposition time of Al is 40s, the deposition cycle is 300 cycles, and the thickness of the obtained multilayer film is about 20 μm. Others are the same as in Embodiment 1.

Embodiment 3

[0044] The difference between this embodiment and the first or second embodiment is that the nanometer multilayer film of Ni and Al is deposited by magnetron sputtering as described in the second step. The process parameters of magnetron sputtering deposition: the deposition power is 300W, the deposition time of Ni is 60s, the deposition time of Al is 50s, and the alternate deposition is 400 cycles, and the thickness of the obtained multilayer film is about 28 μm. Others are identical with embodiment one or two.

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Abstract

The invention belongs to the technical field of laser welding, and provides a method for assisting high-temperature laser brazing through self-propagating reaction of a nano-multilayer film. A double-metal nano-film is alternately deposited on a substrate by adopting a magnetron sputtering method; the deposited double-metal nano-multilayer film is stripped from the substrate; the stripped multilayer film is arranged between two layers of brazing materials, so that a composite intermediate layer is formed; surface pretreatment is conducted on base materials to be welded; and the composite intermediate layer is arranged between obtained base materials, a lap joint mode is adopted for welding, and lasers are adopted for carrying out scanning welding on the composite intermediate layer. The nano-multilayer film is subjected to the self-propagating reaction after being ignited by the lasers, a large amount of heat released by the reaction can melt low-melting-point brazing materials, and thus connection is achieved on both lap joints and whole lap-joint faces in the welding process, so that the joint connecting strength is improved, and material connection is completed. By means of the method, heating nonuniformity of the lasers used as local heat sources can be relieved, the more uniform interface reaction is achieved, and the joint density can be increased.

Description

technical field [0001] The invention belongs to the technical field of laser welding, and in particular relates to the use of self-propagating reaction of nanometer multilayer film as a heat source to assist laser high-temperature brazing. Background technique [0002] Self-propagating high-temperature synthesis is a technology that uses the self-exothermic and self-conductive effects of high chemical reaction heat between reactants to synthesize materials. It can be used to prepare some advanced ceramics, intermetallic compounds and composite materials. As a traditional furnace technology Substitution has gained a lot of attention. [0003] Under the induction of external energy, the multilayer film with a specific nanostructure can undergo a self-propagating reaction, and a high temperature of 1000-3000 ° C can be obtained at the moment of exothermic reaction. On the one hand, it can melt the solder, and on the other hand, it can directly use its reaction product Realize ...

Claims

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Application Information

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IPC IPC(8): B23K28/02B23K1/005
CPCB23K1/0056B23K28/02
Inventor 胡安明马颖李红杨林派
Owner BEIJING UNIV OF TECH
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