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A combined electrode plasma process system and a method for performing plasma processes using combined electrodes.

This invention discloses a combined electrode plasma process system and a method for performing plasma processes using combined electrodes. The combined electrode plasma process system includes a vacuum chamber, an upper electrode, a first electrode, a second electrode, and a double-sided adhesive component. The upper electrode is disposed within the vacuum chamber. The double-sided adhesive component is used to fix the substrate to be processed onto the second electrode. The second electrode can be selectively combined with the first electrode to form a lower electrode. A plasma process space is formed between the lower electrode and the upper electrode to perform plasma processing on the substrate. When the plasma process is stopped, the first electrode and the second electrode can be separated, and the substrate fixed to the second electrode can be removed together for transport. This invention offers the advantage of flexible process timing through the design of the second electrode.
Owner:UVAT TECH CO LTD