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Preparation method for transition metal nitride super-capacitor coating material

A technology for supercapacitors and transition metals, applied in metal material coating technology, hybrid/electric double layer capacitor manufacturing, coating, etc., can solve problems such as complex equipment, high temperature, and difficulty in controlling the oxygen content on the surface of transition nitrides

Inactive Publication Date: 2017-06-13
XIAMEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In comparison, the simple substance direct nitriding method, oxide carbothermal reduction method and microwave synthesis method require higher temperatures in the preparation process, and it is difficult to control the oxygen content on the surface of transition nitrides; chemical vapor deposition also has a rate of The problem is slow, and the equipment is complicated, and the reaction gas is generally toxic and polluting

Method used

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  • Preparation method for transition metal nitride super-capacitor coating material
  • Preparation method for transition metal nitride super-capacitor coating material
  • Preparation method for transition metal nitride super-capacitor coating material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] 1. Substrate pretreatment

[0018] (1) Solvent cleaning treatment. First use acetone to ultrasonically clean for 20 minutes, then use 95% alcohol to ultrasonically clean for 15 minutes, and then rinse with ultrapure water for 5 minutes after taking it out.

[0019] (2) Ion source bombardment cleaning treatment. Use the Hall ion source to clean the matrix for 10 min, and the ambient pressure is 2.3×10 -2 Pa, Ar flow rate is 12sccm, substrate bias voltage is -120V, cathode current is 31A, cathode voltage is 26V, anode current is 7.5A, anode voltage is 70V.

[0020] 2. Deposition pressure reactive magnetron sputtering transition metal nitride ZrN coating at 1.0Pa

[0021] (1) Zr metal target pre-sputtering. Heat the ambient temperature of the chamber to 185°C, and use a mechanical pump and a molecular pump to vacuum the background of the deposition chamber. When the chamber pressure is ≤4.5×10 -5 After Pa, Ar was introduced, the flow rate was set to 45 sccm, the worki...

Embodiment 2

[0031] 1. Substrate pretreatment

[0032] (1) Solvent cleaning treatment. With embodiment 1.

[0033] (2) Ion source bombardment cleaning treatment. With embodiment 1.

[0034] 2. Deposition pressure reactive magnetron sputtering transition metal nitride ZrN coating at 2.0Pa

[0035] (1) Zr metal target pre-sputtering. With embodiment 1.

[0036] (2) Deposit transition metal nitride ZrN coating. Change the chamber pressure to 2.0Pa, and other steps are the same as in Example 1.

[0037] 3. X-ray diffraction (XRD) was used to characterize the phase structure of ZrN coating under 2.0Pa deposition pressure. With embodiment 1.

[0038] 4. SEM coating structure observation

[0039] With embodiment 1.

[0040] 5. Electrical performance test

[0041] Table 1 shows the specific capacitance values ​​of ZrN coatings prepared under different deposition pressures. When the deposition pressure is 2.0Pa, the specific capacitance value of ZrN is 6.5mF / cm 2 .

Embodiment 3

[0043] 1. Substrate pretreatment

[0044] (1) Solvent cleaning treatment. With embodiment 1.

[0045] (2) Ion source bombardment cleaning treatment. With embodiment 1.

[0046] 2. Deposition pressure reactive magnetron sputtering transition metal nitride ZrN coating at 3.0Pa

[0047] (1) Zr metal target pre-sputtering. With embodiment 1.

[0048] (2) Deposit transition metal nitride ZrN coating. Change the chamber pressure to 3.0Pa, and other steps are the same as in Example 1.

[0049] 3. X-ray diffraction (XRD) was used to characterize the phase structure of the ZrN coating under the deposition pressure of 3.0Pa. With embodiment 1.

[0050] 4. SEM coating structure observation

[0051] With embodiment 1.

[0052] 5. Electrical performance test

[0053] Table 1 shows the specific capacitance values ​​of ZrN coatings prepared under different deposition pressures. When the deposition pressure is 3.0Pa, the specific capacitance value of ZrN is 7.9mF / cm 2 .

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Abstract

The invention discloses a preparation method for a transition metal nitride super-capacitor coating material, and relates to a super-capacitor. The transition metal nitride super-capacitor coating material is obtained by performing reactive magnetron sputtering at different deposition pressures. The different deposition pressures are between 1.0 and 5.0 Pa; the transition metal nitride is ZrN, HfN and NbN. By regulating and controlling the deposition pressure during a thin film depositing process, the maximum specific capacitance values of the transition metal nitrides can be respectively 12.0, 13.5, and 10.2 mF / cm<2>; after 20,000 times of recycling, the capacity retention rates are all up to 90 percent.

Description

technical field [0001] The invention relates to a supercapacitor, in particular to a preparation method of a transition metal nitride supercapacitor coating material. Background technique [0002] With the dwindling availability of fossil fuels, the development of efficient energy storage devices has become a very urgent need. Supercapacitor, also known as ultra-large capacity capacitor, its performance is between that of batteries and traditional electrostatic capacitors. It is a new type of energy storage device that can make up for the low energy density of traditional capacitors and the low power density of batteries. It has good temperature characteristics. , high specific capacitance, high energy and power density, short charging time, long service life, energy saving and environmental protection, etc., are widely used in aerospace, electronic products, portable power supplies, electric vehicles and other fields ([1] Simon P, GogotsiY. Materials for electrochemical ca...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/06H01G11/86
CPCY02E60/13C23C14/0036C23C14/0641C23C14/35H01G11/86
Inventor 王周成魏斌斌张东方
Owner XIAMEN UNIV
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