Method for preparing high precision printing round mesh photosensitive adhesive
A technology for printing rotary screen and photosensitive adhesive, which is applied in photomechanical equipment, photo-engraving process of pattern surface, and photosensitive materials for optical mechanical equipment, etc. It is difficult to greatly improve the pattern, and the exposure time is long, so as to achieve the effect of short exposure time, high exposure precision and broad application prospects.
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example 1
[0016] First, measure 12mL of silane coupling agent KH-550, add 500mL of ammonia water with a mass fraction of 1%, stir at 400r / min for 2h, then place it in a constant temperature water bath at 4°C, and add 120mL of trimethylmethyl dropwise at a rate of 2mL / min Oxysilane, after the dropwise addition, continue to stir for 8 hours to obtain a mixed reaction solution; the above mixed reaction solution is left to stand for 2 hours and then filtered to obtain a filter residue, and the filter residue is washed with absolute ethanol and deionized water for 5 times in sequence, and then the washed The filter residue was placed in a drying oven, dried at 110°C to constant weight, then put into a ball mill, milled at 240r / min for 2h, and passed through a 100-mesh sieve to obtain polymethylsilsesquioxane micropowder; Add 150g of polyvinyl alcohol to 1000mL of deionized water, stir at 400r / min and heat to 98°C, after the polyvinyl alcohol is completely dissolved, cool to 60°C, then add 15m...
example 2
[0019] First, measure 10mL of silane coupling agent KH-550, add 400mL of ammonia water with a mass fraction of 1%, stir at 300r / min for 1h, then place it in a constant temperature water bath at 0°C, and add 100mL of trimethylmethyl dropwise at a rate of 1mL / min Oxysilane, after the dropwise addition, continue to stir for 6 hours to obtain a mixed reaction solution; the above mixed reaction solution is left to stand for 1 hour and then filtered to obtain a filter residue, and the filter residue is washed with absolute ethanol and deionized water for 3 times in sequence, and then the washed The filter residue was placed in a drying oven, dried at 105°C to constant weight, then put into a ball mill, milled at 180r / min for 1h, and passed through a 100-mesh sieve to obtain polymethylsilsesquioxane micropowder; Add 120g of polyvinyl alcohol to 800mL of deionized water, stir at 300r / min and heat to 95°C, after the polyvinyl alcohol is completely dissolved, cool to 50°C, then add 12mL ...
example 3
[0022]First, measure 11mL of silane coupling agent KH-550, add 450mL of ammonia water with a mass fraction of 1%, stir at 350r / min for 1h, then place it in a constant temperature water bath at 3°C, and add 110mL of trimethylmethyl dropwise at a rate of 2mL / min Oxysilane, continue to stir for 7 hours after the dropwise addition to obtain a mixed reaction solution; filter the above mixed reaction solution after standing for 2 hours to obtain a filter residue, and wash the filter residue 4 times with absolute ethanol and deionized water successively, and then wash the The filter residue was placed in a drying oven, dried at 107°C to constant weight, then put into a ball mill, milled at 200r / min for 2h, and passed through a 100-mesh sieve to obtain polymethylsilsesquioxane micropowder; weighed Add 130g of polyvinyl alcohol to 900mL of deionized water, stir at 350r / min and heat to 97°C, after the polyvinyl alcohol is completely dissolved, cool to 55°C, then add 13mL of ammonium dich...
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