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(V1-xAlx)N/silicon nitride composite coating

A coating and thin-layer technology, applied in the fields of N/Si3N4 nano-multilayer coating and its preparation, ceramic coating and its preparation, can solve the problems of undefined coating friction coefficient and wear performance, and improve it to achieve low Effects of improved friction coefficient, high temperature stability, and improved wear resistance

Active Publication Date: 2017-07-25
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Chinese patent (application number CN200910055596.4 and application number CN201410044739.2) uses Si 3 N 4 Ceramics are used as constituent materials, which are prepared into TiC / Si by combining with TiC and VC respectively 3 N 4 and VC / Si 3 N 4 Nano multi-layer coatings, the hardness and oxidation resistance of the coatings have been significantly improved compared with the constituent materials TiC and VC, but it is not clear that the friction coefficient and wear performance of these two types of coatings have improved

Method used

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Embodiment 1

[0039] The present invention (V 0.5 al 0.5 )N / Si 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.7Pa, N 2 The gas partial pressure is 0.3Pa, the V-Al composite target power is radio frequency (RF) 200W, the single deposition time is 10 seconds, the Si target is radio frequency (RF) 50W, the single deposition time is 10 seconds, and the substrate temperature is 300°C , the total deposition time is 120min. The resulting (V 0.5 al 0.5 )N / Si 3 N 4 In each repeated cycle in multilayer coating, (V 0.5 al 0.5 ) The thickness of the N layer is 4nm, Si 3 N 4 The layer thickness is 0.4 nm, the total thickness of the coating is about 2 μm, and the hardness is 43.5 GPa.

Embodiment 2

[0041] The present invention (V 0.5 al 0.5 )N / Si 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.7Pa, N 2 The gas partial pressure is 0.3Pa, the V-Al composite target power is radio frequency (RF) 200W, the single deposition time is 10 seconds, the Si target is radio frequency (RF) 90W, the single deposition time is 10 seconds, and the substrate temperature is 300°C , the total deposition time is 130min. The resulting (V 0.5 al 0.5 )N / Si 3 N 4 In each repeated cycle in multilayer coating, (V 1-x al x ) The thickness of the N layer is 4nm, Si 3 N 4 The layer thickness is 0.7nm, the total thickness of the coating is about 2μm, and the hardness is 31GPa.

Embodiment 3

[0043] The present invention (V 0.5 al 0.5 )N / Si 3 N 4 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.7Pa, N 2 The gas partial pressure is 0.3Pa, the V-Al composite target power is radio frequency (RF) 200W, the single deposition time is 10 seconds, the Si target is radio frequency (RF) 130W, the single deposition time is 10 seconds, and the substrate temperature is 300°C , the total deposition time is 150min. The resulting (V 0.5 al 0.5 )N / Si 3 N 4 In each repeated cycle in multilayer coating, (V 0.5 al 0.5 ) The thickness of the N layer is 4nm, Si 3 N 4 The layer thickness is 2nm, the total coating thickness is about 2μm, and the hardness is 26.4GPa.

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Abstract

The invention discloses a (V1-xAlx)N / silicon nitride nanometer multilayer coating and a preparation method of the (V1-xAlx)N / silicon nitride nanometer multilayer coating and belongs to the field of hard ceramic coatings. The (V1-xAlx)N / si3N4 nanometer multilayer coating is formed by repeatedly and alternately arranging (V1-xAlx)N nanometer thin layers and Si3N4 nanometer thin layers in a superposed manner. The preparation method of the (V1-xAlx)N / silicon nitride nanometer multilayer coating comprises the steps that after polishing treatment is conducted on the surface of a base body, Ar gas and N2 gas are introduced into a vacuum chamber, the pressure of reaction gas N2 ranges from 0.01 Pa to 0.5 Pa, the pressure of sputtering gas Ar ranges from 0.3 Pa to 0.9 Pa, the (V1-xAlx)N nanometer thin layers and the Si3N4 nanometer thin layers are repeatedly and alternately deposited on the surface of the base body by the adoption of a double-target radio frequency reaction sputtering method, and the (V1-xAlx)N / si3N4 nanometer multilayer coating is obtained; the prepared (V1-xAlx)N / si3N4 nanometer multilayer coating not only has the excellent friction performance and high-temperature stability, but also has the hardness higher than 40 GPa and the friction coefficient lower than 0.4 and can be widely used as the coating for high-speed cutting tools and other wearproof workpieces used under the high-temperature condition.

Description

technical field [0001] The present invention relates to a kind of ceramic coating and preparation method thereof, particularly a kind of (V 1-x Al x )N / Si 3 N 4 A nanometer multilayer coating and a preparation method thereof belong to the technical field of ceramic materials. Background technique [0002] TiN-based hard ceramic coatings have the advantages of high hardness, good oxidation resistance, and excellent thermal stability, and have been widely used in the field of surface protection of tools and molds. However, with the rapid development of modern high-speed cutting and dry cutting technology, the performance of hard coatings has been continuously put forward more stringent requirements. Due to the large friction coefficient (~0.7) of the TiN-based coating, it is characterized by high cutting force, high working temperature and serious adhesion in high-speed machining, resulting in rapid tool wear and low processing efficiency. Therefore, reducing the friction...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/06
CPCC23C14/0036C23C14/0641C23C14/3464C23C14/3485
Inventor 岳建岭李淼磊黄小忠王恩青
Owner CENT SOUTH UNIV
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