Preparing method of dustproof surface

A dust-proof and plasma technology, applied in the field of ion chemical vapor deposition, can solve the problems of poor substrate bonding, difficult coating preparation, high cost, etc., and achieve good weather resistance, excellent physical and electrical properties.

Active Publication Date: 2017-08-18
JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Difficulty in preparation of coatings in the prior art, selectivity to the substrate, poor bonding with the substrate, high cost and difficulty in large-scale application

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] A method for preparing a dust-proof surface is characterized in that it comprises the following steps:

[0043] (1) The substrate is placed in the reaction chamber of the plasma chamber, the reaction chamber is continuously evacuated, the vacuum degree in the reaction chamber is drawn to 10 mtorr, and the inert gas is introduced;

[0044] In step (1), the substrate is a solid material, and the solid material is a solar panel;

[0045] In step (1), the volume of the plasma chamber is 1000L, and the temperature of the plasma chamber is controlled at 30°C; the flow rate of the inert gas introduced is 5 sccm, and the inert gas is argon.

[0046] (2) Pass the monomer vapor to a vacuum of 30 mtorr, turn on the plasma discharge, the power of the plasma discharge is 2W, the discharge time is 7200s, and perform chemical vapor deposition to prepare a dense coating; after the dense coating is deposited , Adjust the plasma discharge power to 160W, discharge time to 1000s, perform chemical ...

Embodiment 2

[0057] The basic process steps of this embodiment are the same as those of embodiment 1, and the different process parameters are as follows:

[0058] 1. In step (1):

[0059] The vacuum in the reaction chamber is drawn to 40 mtorr, and the inert gas is introduced; the solid material is an LED display; the volume of the plasma chamber is 870L, and the temperature of the plasma chamber is controlled at 35°C; the flow of the inert gas is 15 sccm, the inert gas is helium.

[0060] 2. In step (2):

[0061] Inject monomer vapor to a vacuum of 80 mtorr, turn on the plasma discharge, the power of the plasma discharge is 25W, and the discharge time is 5800s, perform chemical vapor deposition to prepare a dense coating; after the dense coating is deposited, adjust the plasma The power of the body discharge is 220W, and the discharge time is 780s;

[0062] The monomer vapor components introduced in the step (2) are:

[0063] A mixture of three monofunctional unsaturated fluorocarbon resins and o...

Embodiment 3

[0071] The basic process steps of this embodiment are the same as those of embodiment 1, and the different process parameters are as follows:

[0072] 1. In step (1):

[0073] The vacuum in the reaction chamber is drawn to 90 mtorr, and the inert gas is introduced; the solid material is glass; the volume of the plasma chamber is 680L, and the temperature of the plasma chamber is controlled at 40°C; the flow of the inert gas is 50sccm The inert gas is a mixture of helium and argon.

[0074] 2. In step (2):

[0075] Inject monomer vapor to a vacuum of 160 mtorr, turn on the plasma discharge, the power of the plasma discharge is 60W, the discharge time is 4500s, and perform chemical vapor deposition to prepare a dense coating; after the dense coating is deposited, adjust the plasma The power of the body discharge is 300W, and the discharge time is 650s;

[0076] The monomer vapor components introduced in the step (2) are:

[0077] A mixture of four monofunctional unsaturated fluorocarbon ...

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Abstract

The invention discloses a preparing method of a dustproof surface, and belongs to the technical field of plasma chemical vapor phase deposition. According to the method, a base material is placed in a reaction cavity, continuous vacuum pumping is carried out, and inert gases or nitrogen is led in; monomer steam is led to start chemical vapor phase deposition, and a compact coating is prepared; after the compact coating is deposited, power of plasma discharge is adjusted so as to achieve chemical vapor phase deposition, and a rough coating is prepared; a dustproof surface with the inner layer as the compact coating and the outer layer as the rough coating is prepared on the surface of the base material; the lead monomer steam is a mixture of at least one kind of single-functional unsaturated fluorocarbon resin and at least one kind of polyfunctionality unsaturated hydrocarbon derivatives, wherein the mass percent of the polyfunctionality unsaturated hydrocarbon derivatives in the monomer steam ranges from 10% to 80%. low-surface-energy fluorocarbon resin of a micro-nano structure is deposited on the surface of the base body, the surface energy and the contact area of the material are reduced, and the effect of restraining dust absorbing and stacking is achieved.

Description

Technical field [0001] The invention belongs to the technical field of plasma chemical vapor deposition, and specifically relates to a method for preparing a dust-proof surface. Background technique [0002] Due to the high surface energy of the traditional solid surface, it is easy to adsorb dust and spontaneously tends to reduce the surface energy of its surface. Dust not only affects the appearance of the material surface, but also affects the performance and service life of the components. For example, the surface of the lunar rover will affect the lighting of the solar panel after the lunar dust is adsorbed on the surface, and affect the performance of the moving parts of the lunar rover. Solar panels, daylighting glass, outdoor display screens, LED light boxes, etc. are very easy to absorb dust, which seriously affects the performance of daylighting and light transmission. [0003] The existing dust-proof technologies are mainly one is to use low surface energy fluororesin a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/513C23C16/455C23C28/00C23C16/02
CPCC23C16/0263C23C16/45523C23C16/513C23C28/00
Inventor 宗坚
Owner JIANGSU FAVORED NANOTECHNOLOGY CO LTD
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