High-hardness wear-resistant thermal-shock-resistant thick tantalum coating and preparation method thereof
A technology of thermal shock resistance and tantalum coating, which is applied in the field of wear-resistant coatings, can solve the problems of high price, affecting the service performance of coatings, and high cost, so as to improve wear resistance and thermal shock resistance and reduce thermal physical properties Mismatch degree, effect of improving wear resistance and thermal shock resistance
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Embodiment 1
[0039] The substrate is made of 304 stainless steel, the sample size is 15mm×10mm×2mm, and the purity of the tantalum target is 99.99wt%. -2 Pa~7×10 -2 Pa, turn on the heater, heat the vacuum chamber to 200°C, and then pump the background vacuum to below 6×10 -3 Pa (the degree of vacuum in this embodiment is 1×10 -3 Pa). Argon gas was flowed at a rate of 8 sccm and nitrogen gas was supplied at a rate of 5 sccm to a pressure of 0.19 Pa, and sputtering of the target was started. The sputtering target power was set at 2.0 kW, the deposition time was about 4 hours, and the thickness of the tantalum coating was about 50 μm.
[0040] In this embodiment, the cross-section and surface observation of the deposited tantalum coating can be seen to have a dense film structure and a good combination with the substrate, such as figure 1 a and figure 1 As shown in b. X-ray diffraction analysis shows that the existence of almost no β-Ta diffraction peaks can be detected in the coating, ...
Embodiment 2
[0042] The substrate is made of 30CrNi3MoV alloy steel. The sample size is 15mm×10mm×2mm. The purity of the tantalum target is 99.99wt%. -2 Pa~7×10 -2Pa, turn on the heater, heat the vacuum chamber to 200°C, and then pump the background vacuum to below 6×10 -3 Pa (the degree of vacuum in this embodiment is 2×10 -3 Pa). Argon gas was flowed at a rate of 8 sccm and nitrogen gas was supplied at a rate of 3 sccm to a pressure of 0.19 Pa, and sputtering of the target was started. The sputtering target power was set at 2.0 kW, the deposition time was about 1 hour, and the thickness of the tantalum coating was about 15 μm.
[0043] In this embodiment, the cross-section and surface observation of the deposited tantalum coating shows that the structure of the coating is dense and well combined with the substrate. X-ray diffraction analysis shows that almost no β-Ta diffraction peak can be detected in the coating, which is the diffraction peak of pure phase α-Ta.
Embodiment 3
[0045] The substrate is made of PCrNi3MOV alloy steel. The sample size is 15mm×10mm×2mm. The purity of the tantalum target is 99.99wt%. -2 Pa~7×10 -2 Pa, turn on the heater, heat the vacuum chamber to 200°C, and then pump the background vacuum to below 6×10 -3 Pa (the degree of vacuum in this embodiment is 3×10 -3 Pa). Argon gas was flowed at a rate of 8 sccm and nitrogen gas was supplied at a rate of 4 sccm to a pressure of 0.19 Pa, and sputtering of the target was started. The sputtering target power was set at 2.0 kW, the deposition time was about 5 hours, and the thickness of the tantalum coating was about 60 μm.
[0046] In this embodiment, the cross-section and surface observation of the deposited tantalum coating shows that the structure of the coating is dense and well combined with the substrate. X-ray diffraction analysis shows that almost no β-Ta diffraction peaks can be detected in the coating, which are all diffraction peaks of pure phase α-Ta. For the deposi...
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