Mask solution and mask containing same

Abstract

The invention discloses a mask solution. The mask solution contains a moisturizer, wherein the moisturizer is prepared from sodium hyaluronate, trehalose, sodium polyglutamate, betaine, tremella polysaccharide and glyceryl polymethacrylate. The mask solution disclosed by the invention is capable of durably and deeply moisturizing the skin, is good in mildness, is also suitable for skin sensitive persons, is natural and non-toxic, is mild and non-irritant, cannot damage the skin after long-term use, has an obvious effect in improving the skin, and is beneficial for enabling the skin to restore elasticity and be glossy.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to an anti-allergic and non-irritating deep moisturizing mask liquid, a mask using the mask liquid and a preparation method thereof. Background technique [0002] With the continuous progress of social economy and the great enrichment of material life, people not only pay attention to their own health, but also their own skin care has become an important part of people's daily life. Especially with the acceleration of people's life rhythm and the increasing air pollution in modern society, various skin problems such as enlarged pores, greasy face, abnormal skin color and skin wrinkles are bothering more and more people. For this reason, people have been doing in-depth research in the field of medical cosmetology and have developed a variety of skin care products. Masks are one of the most popular products with the fastest skin care effects and the largest growth rate in u...

AI Technical Summary

Problems solved by technology

"This existing patent uses hyaluronic acid, urea, polydimethylsiloxane and glycerin with various molecular weights as the moisturizing ingredients of the facial mask. Although these several ingredients have certain moisturizing effects, they cannot be well Penetrating into the inner layer of the skin for deep moisturizing, it can only moisturize the epidermis of the skin, and the action time is not long, so it cannot moisturize for a long time

Furthermore, this existing patent uses ceramide, nicotinamide and green tea extract tea polyphenols as the anti-allergic components of the facial mask, and the anti-allergic effective content is small, and the anti-allergic effect is not good

And on anticorrosion, this existing patent adopts butanediol and boric acid as the antibacterial composition of facial mask, butylene glycol is a skin care raw material commonly used, and boric acid is a pH regulator, and its two are almost ineffective to bacteria and mold, and the antiseptic effect is not good. it is good

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