Method for preparing nanoparticles by using laser
A nanoparticle and laser technology, applied in nanostructure manufacturing, nanotechnology, nanotechnology, etc., can solve problems such as low production yield, high cost, and complex system
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0043] 1. Preparation device of nanoparticles
[0044] In this example, the preparation device used for the preparation of nanoparticles is as follows figure 1 Shown is irradiated at a maximum power of 60W in CO 2 The laser irradiation part 10 for the laser light generated by the laser generator, the reaction chamber 20, the collection part 30, the vacuum pump 40, and the raw material gas supply nozzle 50a for supplying the raw material gas into the reaction chamber 20 and the nozzle for supplying the carrier gas are included. The injection part 50 of the carrier gas supply nozzle 50b constitutes a general nanoparticle preparation device.
[0045] 2. Preparation of Nanoparticles
[0046] Hereinafter, standard cubic centimeters per minute (Standard Cubic Centimeters Per Minute, sccm), which is a unit used in the present invention, represents a flow rate unit.
Embodiment 1
[0048] 25 sccm (100 parts by volume) of monosilane (SiH 4 ), 100 sccm (400 parts by volume) of hydrogen (H 2 ) and 5 sccm (20 parts by volume) of sulfur hexafluoride (SF 6 ) A mixed gas formed by mixing catalytic gases. At this time, the mixed gas supplied to the inside of the reaction chamber 20 is irradiated by the laser irradiation unit 10 in the form of a continuous wave line beam (Line Beam) with a wavelength of 10.6 μm from CO 2 The laser generator generates laser light for 1 hour, thus, if figure 2 and image 3 As shown, silicon nanoparticles 60 are generated and then recovered through collection section 30 using vacuum pump 40 . In Example 1, the production yield of silicon nanoparticles (Si-NPs) with a particle size of 10-30 nm was 52.4%.
Embodiment 2
[0050] 25 sccm (100 parts by volume) of monosilane (SiH 4 ), 100 sccm (400 parts by volume) of hydrogen (H 2) and 10sccm (40 parts by volume) of sulfur hexafluoride (SF 6 ) A mixed gas formed by mixing catalytic gases. At this time, the mixed gas supplied to the inside of the reaction chamber 20 is irradiated by the laser irradiation unit 10 in the form of a continuous wave line beam (Line Beam) with a wavelength of 10.6 μm from CO 2 Laser generator generates laser light for 3 hours, thus, if figure 2 and image 3 As shown, silicon nanoparticles 60 are generated and then recovered through collection section 30 using vacuum pump 40 . In Example 2, the production yield of silicon nanoparticles (Si-NPs) with a particle size of 10-30 nm was 97.1%.
PUM
| Property | Measurement | Unit |
|---|---|---|
| wavelength | aaaaa | aaaaa |
| particle size | aaaaa | aaaaa |
| size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


