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Photosensitive composition, photosensitive composition for color filter, and color filter

A photosensitive composition, color filter technology, applied in the direction of filters, optics, optomechanical equipment, etc.

Inactive Publication Date: 2018-02-23
TOYO INK SC HOLD CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in Patent Document 3, although a method of forming a pattern using hot stamping or an infrared-absorbing photothermal conversion material is disclosed, there is still room for improvement in the method.

Method used

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  • Photosensitive composition, photosensitive composition for color filter, and color filter
  • Photosensitive composition, photosensitive composition for color filter, and color filter
  • Photosensitive composition, photosensitive composition for color filter, and color filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0589] Hereinafter, the embodiments of the present invention will be described more specifically through examples, but the following examples do not limit the scope of rights of the present invention in any way. In addition, "part" in an Example shows "mass part", and "%" shows "mass %".

[0590] In addition, in the following examples, the molecular weight of the resin is a polystyrene-equivalent weight average molecular weight measured by GPC (gel permeation chromatography), using GPC-8020 manufactured by Tosoh Corporation, using tetrahydrofuran as an eluent, Three TSKgelSuperHM-M columns (manufactured by Tosoh Corporation) were used for measurement at a flow rate of 0.6 ml / min, an injection volume of 10 μl, and a column temperature of 40°C.

[0591] The IR measurement was performed using an infrared spectrometer (Spectrum One) manufactured by PerkinElmer. The measurement of the acid value was performed as follows. About 1 g of the compound solution for acid value measureme...

manufacture example 1

[0597]Add 69.3 parts of propylene glycol monomethyl ether acetate, Desmodur (Desmodur) Z4470BA (isophorone di Isocyanate (Isophorone Diisocyanate, IPDI) isocyanurate, non-volatile content is 70% butyl acetate solution, isocyanate (Isocyanate, NCO) group content is 11.9%) 102.3 parts, furfuryl alcohol 28.4 parts, and dibutyltin dilaurate 0.20 parts were heated to 80° C. while injecting nitrogen gas into the container, stirring was continued for 8 hours, and IR measurement was performed to confirm that the target product was produced. After cooling to room temperature, it was diluted with propylene glycol monomethyl ether acetate to obtain a furyl group-containing compound solution A1 with a nonvolatile content of 20%. Furthermore, the compound does not contain an alkali-soluble group and does not contain a photopolymerizable functional group.

manufacture example 2

[0599] Add 61.3 parts of 2-methacryloyloxyethyl isocyanate, 38.7 parts of furfuryl alcohol, 0.10 parts of dibutyltin dilaurate, and 0.10 parts of methoxyphenol into a reaction vessel equipped with a stirrer, a thermometer, a reflux cooler, and a gas introduction pipe , while injecting dry air into the container, it was heated to 80° C., stirring was continued for 8 hours, and IR measurement was performed to confirm that the target product was produced. After cooling to room temperature, it took out without diluting, and obtained monomer 1 which is a furyl group-containing compound and furyl group-containing monomer (a-1). Furthermore, the compound does not contain an alkali-soluble group but contains a photopolymerizable functional group.

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PUM

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Abstract

The present invention relates to a photosensitive composition that contains a compound (A) containing furyl groups, a compound (B) containing photopolymerizable functional groups, and a photopolymerization initiator (C). According to the present invention, it is possible to provide a photosensitive composition to which drug resistance can be imparted even at low curing temperatures, and which is free of offgassing and compatibility issues.

Description

technical field [0001] The present invention relates to a photosensitive composition capable of obtaining a film or fine pattern excellent in chemical resistance. The photosensitive composition of the present invention can be used for color filters including color liquid crystal display devices, color organic electroluminescence (EL) display devices, solid-state imaging devices, etc., black matrix (black matrix), color filter Wide range of applications such as optical sheet protective film, photo spacer, protrusions for liquid crystal alignment, microlenses, insulating films for touch panels, and adhesives or adhesive sheets for electronic materials around flexible printed wiring boards. Background technique [0002] In general, organic EL display devices (especially white red green blue (WRGB) method that combines white light-emitting organic EL and color filters), liquid crystal display elements, integrated circuit elements, solid-state imaging elements, etc. Films such a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/033C08F20/26C08F220/26G02B5/20G03F7/027
CPCC08F20/26C08F220/26G02B5/20G03F7/027G03F7/033
Inventor 宫本彩子白鸟进尼沙德·佩鲁尔和田宗大山田和则平野彰寺岛嘉孝二井洋文
Owner TOYO INK SC HOLD CO LTD
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