Aluminum-scandium alloy target blank and preparation method and application thereof

An alloy target, an aluminum-scandium technology, which is applied in the field of aluminum-scandium alloy target blank and its preparation, can solve the problems of abnormal discharge or particle splatter, poor film-forming quality and the like

Inactive Publication Date: 2018-03-27
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the traditional aluminum scandium alloy target blank is prone

Method used

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preparation example Construction

[0040] The invention also provides a method for preparing an aluminum-scandium alloy target blank.

[0041] A method for preparing an aluminum-scandium alloy target blank, comprising the steps of:

[0042] S1. Put scandium metal and aluminum metal into the smelting furnace according to the ratio, evacuate to a vacuum degree of 0.1-1.0Pa, and then fill in an inert protective gas for smelting. Then it is cast into shape under an inert atmosphere, and an alloy ingot is obtained after cooling.

[0043] Wherein, the mass ratio of scandium metal to aluminum metal is 0.1-15:85-99.9.

[0044] Among them, the purity of aluminum metal is 99.999%, and the purity of scandium metal is 99.99%.

[0045] In a preferred embodiment, scandium metal is scandium powder or scandium metal block.

[0046] In a preferred embodiment, the aluminum metal is aluminum powder or aluminum metal block.

[0047] Among them, the main function of vacuuming the smelting furnace is to maintain a low vacuum in ...

Embodiment 1

[0084] Select 3958g of aluminum metal blocks with a purity of 99.99%, add 42g of scandium metal blocks with a purity of 99.99% to the melting furnace, then evacuate the melting furnace to a vacuum degree of 0.1Pa, and then fill it with nitrogen for melting. The melting temperature is 800 ℃. Then it is cast into shape under a nitrogen atmosphere, and cooled to obtain an alloy ingot.

[0085] Then the alloy ingot was hot-rolled 20 times to obtain an alloy ingot with a thickness of 10 mm. Wherein, the hot rolling process is as follows: the hot rolling temperature is 450° C., and the hot rolling time is 1 h.

[0086] Then, take the rolled alloy ingot and level it with a leveler, and perform annealing treatment at a temperature of 320° C., and the annealing time is 1 hour. Then mill the surface of the annealed alloy ingot to obtain an aluminum-scandium alloy target blank with a thickness of 10 mm, which is denoted as A1.

[0087] Then, the aluminum-scandium alloy target blank is...

Embodiment 2

[0089] A 3660g aluminum metal block with a purity of 99.99% was selected, and a 340g scandium metal block with a purity of 99.99% was added to the melting furnace, and then the melting furnace was evacuated to a vacuum degree of 0.5 Pa, and then filled with nitrogen for smelting, and the melting temperature was 1000 ℃. Then it is cast into shape under a nitrogen atmosphere, and cooled to obtain an alloy ingot.

[0090] Then the alloy ingot was hot-rolled 20 times to obtain an alloy ingot with a thickness of 10 mm. Wherein, the hot rolling process is as follows: the hot rolling temperature is 500° C., and the hot rolling time is 1 h.

[0091] Then, take the rolled alloy ingot and level it with a leveler, and perform annealing treatment at 350° C. for 1 hour. Then mill the surface of the annealed alloy ingot to obtain an aluminum-scandium alloy target blank with a thickness of 10 mm, which is denoted as A2.

[0092] Then, the aluminum-scandium alloy target blank is bonded to ...

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Abstract

The invention relates to an aluminum-scandium alloy target blank and a preparation method and application thereof. The aluminum-scandium alloy target blank comprises, by weight part, 0.1-15 parts of scandium and 85-99.9 parts of aluminum, and the oxygen content of the aluminum-scandium alloy target blank is smaller than or equal to 160 ppm. The aluminum-scandium alloy target blank has the beneficial effects that the oxygen content is low, then the prepared target blank cannot generate abnormal discharge or particle splashing scars, and later high-quality film forming can be guaranteed; and inaddition, the aluminum-scandium alloy target blank is even in target blank crystal particle size.

Description

technical field [0001] The invention relates to the field of aluminum-scandium alloy materials, in particular to an aluminum-scandium alloy target blank and its preparation method and application. Background technique [0002] Sputtering is required to form aluminum-scandium alloys in many occasions, for example, in the preparation process of micro-electromechanical systems (MEMS) integrating micro-sensors, actuators, signal processing and control circuits, interface circuits, communications and power supplies. Generally, an aluminum-scandium alloy target blank is used as a sputtering source to form an aluminum-scandium film by sputtering. [0003] At present, the traditional aluminum scandium alloy target blank is prone to abnormal discharge or particle spattering, and the film forming quality is poor. Contents of the invention [0004] Based on this, it is necessary to address the above-mentioned problems and provide an aluminum-scandium alloy target blank that is not p...

Claims

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Application Information

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IPC IPC(8): C22C1/02C22C21/00C22F1/04C23C14/14C23C14/34
CPCC22C21/00C22C1/026C22F1/04C23C14/14C23C14/3414
Inventor 程银兵庄志杰顾宗慧庄猛
Owner GEMCH MATERIAL TECH SUZHOU
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