A kind of fiber reinforced metal matrix composite material y 2 o 3 Coating Physical Vapor Deposition Method
A technology of physical vapor deposition and composite materials, which is applied in the field of preparation of composite coatings with alternately superimposed Y2O3 phase structures. The effect of stress concentration
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Embodiment 1
[0032] Wind the continuous SiC fiber with C coating on the sample holder, keep the distance between the fibers at 0.5mm, and put it into the sample chamber of the target magnetron sputtering equipment; vacuumize to make the vacuum of the backside better than 8×10-4Pa. Enter Ar gas, maintain pressure 1Pa, bias -2000V, cleaning time 5min, carry out ion cleaning on fiber surface; feed reaction gas oxygen, O2 / Ar ratio 2%, control working pressure 0.8Pa, deposition temperature 500℃; start direct current Sputtering power supply, the deposition rate is 20nm / min, the deposition time is 50min, the control bias is -100V, and the oxygen-deficient monoclinic phase Y2O3-x (0.3≤x≤1) with a thickness of 1μm is prepared; the O2 / Ar ratio is adjusted to 15 %, the deposition rate is 20nm / min, the deposition time is 50min, and other conditions remain unchanged, a cubic phase Y2O3 with a thickness of 1 μm is prepared; the O2 / Ar ratio is adjusted to 2%, the deposition rate is 20nm / min, the depositio...
Embodiment 2
[0034] Wind the continuous SiC fiber with C coating on the sample holder, keep the distance between the fibers at 0.3mm, and put it into the sample chamber of the target magnetron sputtering equipment; Enter Ar gas, keep the pressure 2Pa, bias -1500V, cleaning time 10min, ion cleaning the surface of the fiber; feed the reaction gas oxygen, O2 / Ar ratio 5%, control the working pressure 0.4Pa, deposition temperature 550 ℃; start DC Sputtering power supply, the deposition rate is 60nm / min, the deposition time is 10min, the control bias is -200V, and the oxygen-deficient monoclinic phase Y2O3-x (0.3≤x≤1) with a thickness of 0.6μm is prepared; adjust the ratio of O2 / Ar 60%, the deposition rate is 40nm / min, the deposition time is 10min, and other conditions remain unchanged, the cubic phase Y2O3 with a thickness of 0.4μm is prepared; the O2 / Ar ratio is adjusted to 5%, the deposition rate is 60nm / min, the deposition time is 10min, and other The conditions are unchanged, and the oxygen...
Embodiment 3
[0036] Wind the continuous SiC fiber with C coating on the sample holder, keep the distance between the fibers at 0.3mm, and put it into the sample chamber of the target magnetron sputtering equipment; Enter Ar gas, maintain pressure 2Pa, bias -1500V, cleaning time 10min, carry out ion cleaning on fiber surface; feed reaction gas oxygen, O2 / Ar ratio 50%, control working pressure 0.8Pa, deposition temperature 550 ℃; start DC Sputtering power supply, the deposition rate is 30nm / min, the deposition time is 20min, the control bias is -150V, and the cubic phase Y2O3 with a thickness of 0.6μm is prepared; the O2 / Ar ratio is adjusted to 10%, the deposition rate is 4nm / min, and the deposition time 50min, other conditions remain the same, prepare an oxygen-deficient monoclinic phase Y2O3-x (0.3≤x≤1) with a thickness of 0.2μm; adjust the O2 / Ar ratio to 50%, the deposition rate is 30nm / min, the deposition time is 20min, and other Cubic phase Y2O3 with a thickness of 0.6 μm was prepared u...
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