Alkali-soluble resin polymer and preparation method thereof and photosensitive resin composition

A technology of alkali-soluble resins and polymers, which is applied in the field of alkali-soluble resin polymers and photosensitive resin compositions, and can solve the problems of precipitation, insufficient pixel line width, and reduced stability of resin compositions, etc.

Active Publication Date: 2018-05-11
GUAN ETERNAL MATERIAL TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the above methods often bring many problems, such as poor matching between the alkali-soluble resin and the pigment dispersion, resulting in a decrease in the stability of the resin composition, and even precipitation of precipitates in a short period of time; in addition, due to the increase in alkali solubility of the resin, resulting in The pixel line width is not enough to meet the process requirements

Method used

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  • Alkali-soluble resin polymer and preparation method thereof and photosensitive resin composition
  • Alkali-soluble resin polymer and preparation method thereof and photosensitive resin composition
  • Alkali-soluble resin polymer and preparation method thereof and photosensitive resin composition

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preparation example Construction

[0066] The preparation method of the above-mentioned color filter may include: coating the above-mentioned photosensitive resin composition on a substrate, and sequentially undergoing steps of pre-baking, exposure, development and post-baking to obtain the color filter.

[0067] The present disclosure is further illustrated by examples below, but the present disclosure is not limited thereby.

Embodiment 1

[0069] In a 200mL flask, add 28g monomer acryloyl morpholine (Bainwei), 37g benzyl methacrylate, 20g N-phenylmaleimide, 240g propylene glycol methyl ether acetate, 0.3mL molecular weight regulator, nitrogen protection, Heat the system to 80°C, and add 17 g of propylene glycol methyl ether acetate solution and 15 g of methacrylic acid in 1.0 g of azobisisobutyronitrile into the three-necked flask dropwise within 30 minutes using a constant pressure dropping funnel , followed by constant temperature stirring for 3 hours, the temperature was lowered to room temperature, and the solvent was removed to obtain the alkali-soluble resin polymer B1. The weight-average molecular weight of the polymer measured by GPC was 8360, the molecular weight distribution was 2.13, and the acid value was 106.3 mgKOH / g.

Embodiment 2

[0071] In a 200mL flask, add 28g monomer acryloyl morpholine (Bainwei), 34g benzyl methacrylate, 20g N-phenylmaleimide, 240g propylene glycol methyl ether acetate, 0.3mL molecular weight regulator, nitrogen protection, Heat the system to 85°C, and under stirring, use a constant pressure dropping funnel to drop 17g of propylene glycol methyl ether acetate solution and 18g of methacrylic acid dissolved in 1.05g of azobisisobutyronitrile into the three-necked flask within 30min. , followed by constant temperature stirring for 3 hours, the temperature was lowered to room temperature, and the solvent was removed to obtain the alkali-soluble resin polymer B2. The weight-average molecular weight of the polymer measured by GPC was 8100, the molecular weight distribution was 1.95, and the acid value was 113.2 mgKOH / g.

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Abstract

The present disclosure relates to an alkali-soluble resin polymer and a preparation method thereof and a photosensitive resin composition. The alkali-soluble resin polymer is a copolymer containing afirst structural unit and a second structural unit. The first structural unit having a nitrogen-containing six-membered ring is introduced into the polymer, and the first structural unit has good water solubility, and can improve the developing performance of the polymer, the nitrogen-containing six-membered ring also helps to improve the attachment force to a substrate, and increases pixel line width; nitrogen radicals in the nitrogen-containing six-membered ring can suppress oxygen-induced polymerization inhibition reaction, and can prolong the life of free radicals in the photopolymerization process, thereby increasing the polymerization efficiency and the monomer conversion rate. In the developing process, the film loss is small, the residual film rate is increased, and the network structure formed after curing is more compact; the polymer containing the first structural unit has good heat resistance, and can effectively avoid the color difference caused by the thermal baking process. The photosensitive resin composition comprising the polymer has good storage stability.

Description

technical field [0001] The present disclosure relates to the field of liquid crystal display materials, in particular to an alkali-soluble resin polymer, a preparation method thereof and a photosensitive resin composition. Background technique [0002] The color filter is a key device for liquid crystal display to achieve colorization, and the performance of the color photoresist used to prepare the color filter directly affects the display effect of the liquid crystal display. With the development trend of high color purity and high contrast of liquid crystal display, the particle size of the colorant contained in the photosensitive resin composition is required to be smaller and smaller, and the concentration is higher and higher. In order to achieve the dispersion stability of the pigment dispersion, it is necessary to add A large amount of dispersants containing amine groups lead to a decline in the development performance of the coating film of the color photoresist, wh...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F220/18C08F220/58C08F220/06C08F216/36G03F7/027
CPCC08F220/18C08F220/58G03F7/027C08F220/06C08F216/36
Inventor 刘永祥孙涛任雪艳刘昌范
Owner GUAN ETERNAL MATERIAL TECH
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