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Imprinting ink composition, imprinting method, optical element lighting device, optical sensor and photovoltaic device

A technology for ink compositions and optical components, applied in the directions of ink, optics, measuring devices, etc., can solve problems such as difficulty, reduced material stability, yellowing/browning mechanical properties, etc.

Pending Publication Date: 2018-06-08
KONINKLJIJKE PHILIPS NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is difficult to obtain patterned layers with higher refractive index in this way because of the high content of organic polymers required in these layers to combine TiO 2 Nanoparticles separate from each other
In addition, TiO 2 Incorporation of nanoparticles in organic matrices reduces the stability of these materials to light and temperature
TiO 2 Surfaces can catalyze degradation and oxidation of organic matrices, resulting in yellowing / browning and loss of mechanical properties

Method used

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  • Imprinting ink composition, imprinting method, optical element lighting device, optical sensor and photovoltaic device
  • Imprinting ink composition, imprinting method, optical element lighting device, optical sensor and photovoltaic device
  • Imprinting ink composition, imprinting method, optical element lighting device, optical sensor and photovoltaic device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0132] By mixing anatase TiO with a particle size distribution of 5-30 nm as the polymerization component 2 Nanoparticles (purchased from Nanoamor, http: / / www.Nanoamor-europe.com / nanomaterials / nanoparticles / single- metal-oxides / tio2-nanopowders / titaniumoxide5420ht.html ) of 15% acidified aqueous dispersion (the amount is 9.0wt% of the total weight of the embossing ink composition) and EEOL as a polymerization inhibitor (the amount is 0.4wt% of the total weight of the embossing ink composition) An embossing ink composition with a total weight of 20 grams was obtained. The pH of the composition was adjusted to 2.0-2.5 by adding 37 wt% (based on the total weight of the imprint ink composition) of 1.3% ammonia in methanol and spin-coated onto a silicon wafer at 1000 rpm. The layer thus formed was subsequently (post)cured at 90° C. for 30 minutes.

Embodiment 2

[0134] The amount of EEOL used as a polymerization inhibitor in Example 1 was increased to about 0.7% by weight (based on the total weight of the embossing ink composition).

Embodiment 3

[0136] The EEOL used as the polymerization inhibitor in Example 1 was replaced by 1,2-propanediol, and the amount thereof was about 0.6% by weight (based on the total weight of the embossing ink composition).

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Abstract

Disclosed are imprinting ink compositions for use in imprinting techniques such as SCIL. The imprinting ink compositions comprise TMO nanoparticles stabilized by selected polymerization inhibitors that allow for the formation of a stable imprinting ink composition in which polymerization of the TMO nanoparticles is effectively suppressed and from which high refractive index patterned layers can beformed. Imprinting methods using such imprinting ink compositions, optical devices including patterned layers formed from such imprinting ink compositions and lighting devices, optical sensors and photovoltaic devices including such optical elements are also disclosed.

Description

technical field [0001] The present invention relates to embossing ink compositions comprising a solvent and a polymerizable component dissolved and / or dispersed in the solvent, the polymerizable component comprising transition metal oxide nanoparticles. [0002] The present invention also relates to methods of forming patterned layers using such embossing ink compositions. [0003] The invention also relates to optical elements comprising such a patterned layer. [0004] The invention also relates to a lighting device, an optical sensor or a photovoltaic device comprising such an optical element. Background technique [0005] Direct patterning of high-index materials is of interest for applications such as photonics, LEDs, and photovoltaics. In particular, materials which can achieve a refractive index of greater than n=1.8 to n=2.5 and which have virtually no absorption in the visible wavelength range are interesting and difficult to obtain. For example, this high index ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D11/00C09D11/02C09D11/037C09D17/00G03F7/00
CPCC09D11/00C09D11/02C09D11/037G03F7/0002Y02E10/52C09D11/102G03F7/00H01L31/0232H01L31/054H01L33/58C09D17/007C09D17/008H01L31/0543G01J1/0407H01L31/02327H01L2933/0058
Inventor M·A·维尔斯储雷恩A·索仁
Owner KONINKLJIJKE PHILIPS NV