Plant mask and preparation technology thereof

Abstract

The invention discloses plant mask and a preparation technology thereof. The plant mask is prepared from the following components in parts by weight: 24 to 30 parts of plant extract, 8 to 10 parts ofphytosterol, 15 to 25 parts of plant modified SOD (Superoxide Dismutase), 5 to 6 parts of vitamin C ethyl ether, 13 to 15 parts of butylene glycol, 4 to 5 parts of sarcosine, 3 to 7 parts of inositol,0.8 to 1.6 parts of niacinamide, 16 to 22 parts of sodium pyrrolidonecarboxylate, 4 to 8 parts of xanthan gum, 6 to 8 parts of hyaluronic acid, 3 to 5 parts of coenzyme Q, 4 to 6 parts of ceramide, 0.6 to 1.4 parts of dipotassium glycyrrhizinate, 6 to 10 parts of cross-linked silk fibroin fibers and 50 to 70 parts of de-ionized water, wherein the cross-linked silk fibroin fibers are of a base material of the plant mask and is a coupled product of cocoon fiber silk fibroin fibers and glycerin triglycidyl ether. The plant mask disclosed by the invention takes natural plant components, vitamin or skin matrix components as the raw materials, is healthy and has no pollution; any allergic or irritating effect is not generated so that the plant mask is suitable for people with various skin typesand has relatively strong moisturizing, repairing, whitening and anti-oxidization functions.

Description

technical field [0001] The invention relates to the field of beauty and skin care products, in particular to a plant facial mask and a preparation process thereof. Background technique [0002] The main material of the plant mask comes from natural plants. Compared with traditional chemical masks, it does not contain chemical substances such as pigments, fragrances, heavy metals, and surfactants. It has no natural side effects on the skin and is suitable for allergic skin types. For example, lead and mercury are seriously exceeded in many whitening masks, because lead and mercury can replace copper atoms in the amino acid enzyme that synthesizes pigments, and then play a quick-acting and short-term whitening effect. Surfactants in the mask play a major role. Cleanses, emulsifies oils. [0003] At present, commercially available plant masks generally contain chemical preservatives or antibacterial agents to ensure that the mask will not deteriorate during the shelf life, suc...

AI Technical Summary

Problems solved by technology

The patent application number is CN201710164510.6, which discloses a pure natural nano-plant enzyme mask. The plant enzyme mask uses imidazolidinyl urea and preservatives to inhibit the reproduction of microorganisms. The imidazolidinyl urea releases formaldehyde through a slow decomposition process, thereby achieving the effect of sterilization. Purpose, once used inappropriately, it will cause serious harm to the human body. In addition, the mask also contains titanium dioxide, which can easily cause pore clogging symptoms

The patent with the application number CN201710513243.9 discloses a natural and healthy plant mask and its processing technology. The plant mask uses chlorphenesin as a preservative, and it is easy to cause irritation and contact dermatitis for people with sensitive and dry skin. It also relaxes skeletal muscles, depresses the central nervous system, and causes respiratory depression problems in infants

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