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Centrifugal pump impeller surface treatment method and equipment

A centrifugal pump impeller, surface treatment technology, applied in the direction of ion implantation plating, coating, metal material coating process, etc. Effect

Active Publication Date: 2018-08-24
BEIJING NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention aims to solve the problems described above

Method used

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  • Centrifugal pump impeller surface treatment method and equipment
  • Centrifugal pump impeller surface treatment method and equipment
  • Centrifugal pump impeller surface treatment method and equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] S1: When wet spraying the surface of the substrate, the particle size of the sand is 200-500 mesh, and the wet spraying treatment time is 60-120s; then immerse the substrate in acetone and alcohol for ultrasonic cleaning to remove oil and fat.

[0058] S2: Ti target is used as the cathode, the ion energy of the metal ion source is 80KeV, and the beam intensity is 6mA;

[0059] S3: Magnetic filtration deposition, the first magnetic filtration target is Cr with an arcing current of 100A; the second magnetic filtration target is TiAl, and the arcing current is 100A. The high-power pulsed magnetron sputtering target is alumina, the deposition arc current is 80A, the frequency is adjusted to 600HZ, the pulse width is 100 microseconds, and the peak power is 1MW; the defocus line package frequency is 500HZ, the current is 60A, and the motor rotation speed is 100 revolutions per minute, the mixed gas of acetylene and nitrogen is mixed according to 1:1, the gas volume is S=250si...

Embodiment 2

[0061] S1: When wet spraying the surface of the substrate, the particle size of the sand is 200-500 mesh, and the wet spraying treatment time is 60-120s; then immerse the substrate in acetone and alcohol for ultrasonic cleaning to remove oil and fat.

[0062] S2: Ti target is used as the cathode, the ion energy of the metal ion source is 80KeV, and the beam intensity is 6mA;

[0063] S3: Magnetic filtration deposition, the first magnetic filtration target is Cr with an arcing current of 100A; the second magnetic filtration target is TiAl, and the arcing current is 100A. The high-power pulsed magnetron sputtering target is alumina, the deposition arc current is 80A, the frequency is adjusted to 600HZ, the pulse width is 100 microseconds, and the peak power is 1MW; the defocus line package frequency is 500HZ, the current is 60A, and the motor rotation speed is 200 revolutions per minute, the mixed gas of acetylene and nitrogen is mixed according to 1:1, the gas volume is S=250si...

Embodiment 3

[0065] S1: When wet spraying the surface of the substrate, the particle size of the sand is 200-500 mesh, and the wet spraying treatment time is 60-120s; then immerse the substrate in acetone and alcohol for ultrasonic cleaning to remove oil and fat.

[0066] S2: Ti target is used as the cathode, the ion energy of the metal ion source is 80KeV, and the beam intensity is 6mA;

[0067] S3: Magnetic filtration deposition, the first magnetic filtration target is Cr with an arcing current of 100A; the second magnetic filtration target is TiAl, and the arcing current is 100A. The high-power pulsed magnetron sputtering target is alumina, the deposition arc current is 80A, the frequency is adjusted to 600HZ, the pulse width is 100 microseconds, and the peak power is 1MW; the defocus line package frequency is 500HZ, the current is 60A, and the motor rotation speed is 250 revolutions per minute, the mixed gas of acetylene and nitrogen is mixed according to 1:1, the gas volume is S=250si...

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Abstract

The invention discloses a centrifugal pump impeller surface treatment method and equipment. The centrifugal pump impeller surface treatment method comprises the following steps that 1, the surface ofan impeller is degreased and cleaned by using pre-treatment equipment; 2, surface structure dissimilation treatment on a substrate of the impeller is performed by using a wide beam double accelerationlevel metal ion source; the diameter of a beam spot extracted by the wide beam metal ion source is 800mm, the dissimilation treatment of the surface / subsurface structure of the impeller within 800mmcan be met, and compressive stress is generated to enhance the membrane-based bonding force; and 3, surface deposition coating on the impeller is simultaneously carried out by using the metal ion source, a magnetic filtration deposition system and a high-power pulse magnetron sputtering system. Controlling parameters such as the speed of revolution can facilitate the deposition of a sawtooth gradient film layer, a gradually-changing gradient and a functional gradient film layer. The coating structure prepared by the method can conveniently realize alterative structure changes, compared with traditional coating, the coating has high cavitation resistance, higher crack growth resistance and film compactness close to body materials.

Description

technical field [0001] The invention belongs to the field of film deposition, and in particular relates to a method for preparing a cavitation-resistant water turbine blade. Background technique [0002] In 1902, impeller cavitation was first discovered on the propeller of the British destroyer "Cobra". Then the same phenomenon is seen in hydraulic structures and hydraulic machinery. At that time, it was believed that the spalling of the blade material was caused by seawater corrosion, but experiments proved that similar spalling would occur in objects moving in distilled water, thus confirming that this phenomenon was only the result of mechanical impact. According to the analysis, both of the above factors play a role. In the process of cavitation, the cavitation rapidly generates, expands, and collapses rapidly, forming a shock wave or a high-speed microjet in the liquid. After the metal material is impacted, the surface crystal structure is distorted, chemical instabi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/48C23C14/16C23C14/02C23C14/34
CPCC23C14/028C23C14/165C23C14/3485C23C14/35C23C14/48
Inventor 廖斌欧阳晓平张旭吴先映左帅韩然刘建武杨晓峰罗军庞盼
Owner BEIJING NORMAL UNIVERSITY
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