Silica and zinc oxide anti-reflection film for dye-sensitized solar cells and preparation method

A solar cell and dye sensitization technology, which is applied in the field of anti-reflection film preparation for dye-sensitized solar cells, can solve the problems of reducing light transmittance, etc., and achieve the effect of increasing transmittance and improving efficiency

Active Publication Date: 2018-08-31
CHINA THREE GORGES UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

TiO 2 The dense layer can reduce the recombination between FTO and the electrolyte, but reduces the light transmittance. The present invention hopes to improve the light utilization rate through silicon dioxide and zinc oxide anti-reflective films

Method used

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  • Silica and zinc oxide anti-reflection film for dye-sensitized solar cells and preparation method
  • Silica and zinc oxide anti-reflection film for dye-sensitized solar cells and preparation method
  • Silica and zinc oxide anti-reflection film for dye-sensitized solar cells and preparation method

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preparation example Construction

[0031] The preparation method of silicon dioxide and zinc oxide anti-reflection film for dye-sensitized solar cells comprises the following steps:

[0032] In step 1, zinc acetate is used as a zinc source, and triethanolamine is used as a catalyst to provide an alkaline environment and a stable pH value. Under ice-bath conditions, zinc acetate and triethanolamine were added to absolute ethanol, mixed uniformly and stirred for 15 minutes, heated to 45° C. and stirred for 1 hour to obtain ZnO sol. The ZnO sol was coated on the conductive surface of the FTO by the spin coating method, and then dried at 100°C for 10 min, and the anti-reflection ZnO film was obtained by repeating twice.

[0033] In step 2, butyl titanate is used as a titanium source and triethanolamine is used as a catalyst to provide an alkaline environment and a stable pH value. Under ice bath conditions, add butyl titanate and triethanolamine to absolute ethanol, mix well and stir at room temperature for 12 hou...

Embodiment 1

[0038] A SiO 2 Antireflection film is used for the preparation method of dye-sensitized solar cell, and its technological process is as follows:

[0039] In step 1, butyl titanate is used as a titanium source and triethanolamine is used as a catalyst to provide an alkaline environment and a stable pH value. Under ice bath conditions, add butyl titanate and triethanolamine to absolute ethanol, mix well and stir at room temperature for 12 hours to obtain TiO 2 Sol. TiO was coated by spin coating 2 The sol is coated on the surface of the ZnO film, and then calcined at 500 ° C for 30 min to obtain the ZnO anti-reflection layer and TiO 2 dense layer.

[0040] Step 2, using screen printing method on TiO 2 A layer of porous TiO with a thickness of 10 μm was printed on the dense layer 2 The electrode was sintered at 500°C for 30 minutes, and the N719 dye was adsorbed for 12 hours. The photoanode and the counter electrode were connected through a quasi-solid electrolyte to assemb...

Embodiment 2

[0044] A preparation method of ZnO anti-reflection film, its technical process is as follows:

[0045] Under the condition of ice bath, add zinc acetate and triethanolamine to absolute ethanol, mix uniformly and stir for 15min, the molar ratio of zinc acetate and triethanolamine is 1:1, heat to 45°C and stir for 1h to obtain ZnO sol. The ZnO sol was coated on the conductive surface of the FTO by the spin coating method, and then dried at 100°C for 10 min, and the anti-reflection ZnO film was obtained by repeating twice.

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Abstract

The invention relates to a silica and zinc oxide anti-reflection film for dye-sensitized solar cells and a preparation method thereof. SiO2 with a refractive index of 1.3 is placed on the glass surface of the conductive glass FTO, and ZnO with a refractive index of 1.9 is placed on the conductive surface of the conductive glass FTO, which forms a gradient change with the refractive index of the conductive glass to improve the transmission of the conductive glass, thereby finally improving the efficiency of dye-sensitized solar cells. The anti-reflection film obtained by the invention can not only improve the transmittance of the conductive glass, but also enhance the electron transport efficiency, and is used for the quasi-solid-state dye-sensitized solar cell, and the photoelectric conversion efficiency of the cell can be increased from 4.71% to 5.63. %.

Description

technical field [0001] The invention relates to the technical field of preparation of an anti-reflection film for a dye-sensitized solar cell, in particular to a silicon dioxide and zinc oxide anti-reflection film and a preparation method thereof. Background technique [0002] Dye-sensitized solar cells (DSSCs) are considered to have good application prospects due to their low manufacturing cost and good energy conversion efficiency, but the efficiency of DSSCs is lower than other commercial solar cells, mainly due to the light loss and large amount of DSSCs. compound. In order to improve the conversion efficiency of DSSC, it is necessary to improve the light utilization rate and electron transport ability. [0003] There are many studies on anti-reflection films, but most of them are used in silicon cells and copper indium gallium selenide cells. There are few reports on DSSC using anti-reflection films. Chanta et al. prepared ZnO anti-reflection coating on the surface of...

Claims

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Application Information

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IPC IPC(8): H01G9/042H01G9/20H01L51/42H01L51/48
CPCH01G9/042H01G9/20H10K30/65H10K30/00Y02E10/542Y02E10/549
Inventor 向鹏谭新玉李炜吕福肖婷姜礼华
Owner CHINA THREE GORGES UNIV
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