Pressure-sensitive graphene film preparation method

A graphene film and graphene film technology, applied in graphene, chemical instruments and methods, inorganic chemistry, etc., can solve the problems of heavy pollution, weak compression fatigue resistance, single airbag wall, etc., and achieve high sensitivity and film thickness Appropriate, Controlling Appropriate Effects

Active Publication Date: 2018-09-28
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the electrical and thermal properties of the graphene film prepared by its preparation method are limited by the chemical reduction method, which cannot take into account the application fields such as thermal conductivity and electrical conductivity.
Later, we prepared non-creased graphene film by immersion reduction method, but the amount of reducing agent used in this method is too large, the pollution is heavy, and it cannot be produced industrially, and the airbag wall is single, and the resistance to compression fatigue is slightly weak.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] (1) With 6mg / mL graphene oxide aqueous solution, dry naturally after film formation, obtain the graphene oxide film that thickness is 3um;

[0020] (2) The graphene oxide film is reduced in hydroiodic acid vapor, the hydroiodic acid content is 0.1wt%, the reduction temperature is 80 degrees Celsius, and the reduction time is about 8h; the reduced graphene film is washed with ethanol to remove the surface Reducer, then dry naturally.

[0021] (3) Place the reduced graphene film in a graphite furnace for sintering, perform two-step high-temperature treatment with the parameters described in Tables 1 to 3 below, and test the stability and compressibility of the treated graphene film.

[0022] Table 1

[0023]

[0024] Under the conditions of 1-5 and 1-6, the heating rate in the first stage is too fast, and the gas is released violently, which leads to the damage of the graphene film. On the one hand, the surface of the film is no longer uniform. As for hindering the f...

Embodiment 2

[0034] (1) 10mg / mL graphene oxide aqueous solution is dried naturally after film formation to obtain a graphene oxide film with a thickness of 10um;

[0035] (2) reducing the graphene oxide film in hydrazine hydrate vapor, the hydrazine hydrate content is 15wt%, the reduction temperature is 120 degrees Celsius, and the reduction time is about 12h; the reduced graphene film is washed with ethanol to remove the surface reducing agent, Then let it dry naturally.

[0036] (3) The reduced graphene film is placed in a graphite furnace for sintering, the temperature is raised to 300 degrees Celsius at 4 degrees Celsius per minute, and the temperature is raised to 1600 degrees Celsius at 5 degrees Celsius per minute to obtain a graphene film with high fatigue resistance.

[0037] After testing, the graphene film has a multi-level delamination structure with holes inside, can withstand bending at various extreme temperatures, can still maintain good elasticity after deformation at extr...

Embodiment 3

[0039] (1) With 7mg / mL graphene oxide aqueous solution, dry naturally after film formation, obtain the graphene oxide film that thickness is 5um;

[0040] (2) reducing the graphene oxide film in hydrazine hydrate vapor, the hydrazine hydrate content is 5wt%, the reduction temperature is 100 degrees Celsius, and the reduction time is about 12h; the reduced graphene film is washed with ethanol to remove the surface reducing agent, Then let it dry naturally.

[0041] (3) The reduced graphene film is placed in a graphite furnace for sintering, and the temperature is raised to 300 degrees Celsius at 1 degree Celsius per minute, and to 1800 degrees Celsius at 10 degrees Celsius per minute to obtain a graphene film with high fatigue resistance.

[0042] Such as figure 1 , the porous graphene is compressed and deformed, and the inside of the graphene film is in contact with each other, thereby reducing the resistance. The multi-level delamination structure of the graphene film enabl...

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Abstract

The invention discloses a pressure-sensitive graphene film preparation method. Graphene oxide is subjected to solution film formation, chemical steam reduction, high-temperature sintering and the liketo obtain a graphene film. The graphene film is high in flexibility and free of marks after being repeatedly folded by more than 100 thousands of times and is quick in shape recovery (50ms). The high-flexibility elastic graphene film is resistant to repeated folding of more than 100 thousands of times, the horizontal elastic elongation at break is 12-24%, the elastic vertical compression rate is80-90%, and the electric conductivity is 400-700S/cm. The high-flexibility elastic graphene film is highly sensitive to pressure and can be used as a high-fatigue-resistance pressure sensor.

Description

technical field [0001] The invention relates to a novel elastic graphene membrane material, in particular to a preparation method of a pressure-sensitive graphene membrane. Background technique [0002] In 2010, two professors Andre GeiM and Konstantin Novoselov from the University of Manchester won the Nobel Prize in Physics for their first successful separation of stable graphene, which set off a wave of research on graphene around the world. Graphene has excellent electrical properties (electron mobility at room temperature can reach 2×10 5 m 2 / Vs), outstanding thermal conductivity (5000W / (MK), extraordinary specific surface area (2630M 2 / g), its Young's modulus (1100GPa) and breaking strength (125GPa). The excellent electrical and thermal conductivity of graphene completely exceeds that of metals. At the same time, graphene has the advantages of high temperature resistance and corrosion resistance, and its good mechanical properties and low density make it have the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/184C01B32/194
CPCC01B32/184C01B32/194C01B2204/22C01B2204/26
Inventor 高超刘一晗彭蠡郭燕
Owner ZHEJIANG UNIV
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