Epoxy resin composition for sealing semiconductor device and semiconductor device sealed using same
A technology of epoxy resin and composition, which is applied in the direction of semiconductor/solid-state device parts, semiconductor devices, electric solid-state devices, etc., can solve the problem of low adhesion of silicon nitride film, and achieve the suppression of interface delamination and good strength , toughness and the effect of minimizing deterioration of flow balance
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[0126] Now, the present invention will be described in detail with reference to Examples and Comparative Examples.
[0127] The details of the components used in Examples and Comparative Examples are as follows:
[0128] (A) epoxy resin:
[0129] (A1) HP-4770 (DIC Corporation, equivalent weight: 204).
[0130] (A2) YX-8800 (Japan Epoxy Resin, equivalent weight: 181).
[0131] (B) curing agent:
[0132] (B1) MEH-7500-3S (Meiwa Chem, equivalent weight: 103).
[0133] (B2) MEH-7851S (Meiwa Chem, equivalent weight: 203).
[0134] (C) Inorganic filler:
[0135] A mixture of fused silica (Admatechs Co., Ltd.) with an average particle diameter of 20 μm and synthetic silica (Admatechs Co., Ltd.) with an average particle diameter of 0.5 μm (fused silica and synthetic silica The weight ratio: 9:1).
[0136] (D) Aromatic monomer: m-phenylenediamine (Sigma Aldrich, equivalent weight: 54).
[0137] (E) Reactive rubber: carboxy-terminated butadiene-acrylonitrile (Sigma Aldrich, equi...
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