Superposed film photocatalyst for photochemical purifying gas, preparation method and application thereof

A photocatalyst and gas purification technology, which is applied in the field of air purification, can solve the problems such as the difficulty in the process of loading metal nanoparticles, and achieve the effects of convenient removal and renewal, reduced catalyst consumption, and strong adhesion

Active Publication Date: 2018-11-23
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the difficulty in the preparation of the carrier film itself and the difficulty in the process of loading metal nanoparticles, there is currently no laminated film photocatalyst and post-it technology for photocatalytic gas purification, especially for visible light (sunlight, indoor light source) conditions. Laminated thin-film photocatalyst and post-it note technology for photocatalytic gas purification

Method used

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  • Superposed film photocatalyst for photochemical purifying gas, preparation method and application thereof
  • Superposed film photocatalyst for photochemical purifying gas, preparation method and application thereof
  • Superposed film photocatalyst for photochemical purifying gas, preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Step 1, preparing a carrier film: using quartz glass (2.5cm x 2.5cm) as a substrate, uniformly deposit titanium dioxide formed by the reaction of tetraisopropyl titanate and water vapor on the quartz glass by atmospheric pressure chemical vapor deposition.

[0029] Step 2, carrier film firing: the carrier film on the quartz glass is raised to 500° C. at a rate of 5° C. / min, and maintained for 2 hours to prepare an anatase titanium dioxide film.

[0030] Step 3, load active components: add urea and chloroauric acid solution to deionized water, stir vigorously to obtain a mixed solution, the concentration of urea in the mixed solution is 0.062mol / L, and the concentration of chloroauric acid is 0.0005mol / L. The prepared anatase titanium dioxide film was put into the mixed solution, and the mixed solution was heated in a water bath, the temperature of the water bath was 80° C., and the time was 4 hours. Afterwards, the film was taken out, rinsed with deionized water, and th...

Embodiment 2

[0034] Taking polytetrafluoroethylene as the substrate, after carrying out nitrogen plasma treatment to it, adopt the method of step 1 of embodiment 1 to prepare the carrier film and the method of step 3 of embodiment 1 to load active components, and use oxygen plasma mode to treat the catalyst Thin film is activated to prepare Au / TiO 2 film. The actual content of the active component Au in the catalyst film is 0.01 μg / cm 2 , the mass percentage of the active component in the catalyst film is 0.1%. The other side of the substrate (without the catalyst) is coated with a non-adhesive adhesive to finally obtain a laminated film post-it note for photocatalytic gas purification. Paste it on the wall facing the light side of the bedroom to purify the indoor air with photocatalysis. In order to improve the air purification effect, you can turn on the fan, and when the humidity is low, start the air humidifier at the same time.

Embodiment 3

[0036]Using polyethylene as the substrate, using the method of preparing the carrier film in step 1 of Example 1 and the method of loading active components in step 3 of Example 1, the catalyst film is activated by argon plasma to prepare Au / TiO 2 Thin film, the actual content of active component Au in the catalyst film is 1g / cm 2 , the mass percentage of the active component in the catalyst thin film is 60%. Place it on the bathroom floor, turn on the light source, start the ventilation fan, and purify the indoor air with photocatalysis.

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Abstract

The invention belongs to the technical field of air purifying, and discloses a superposed film photocatalyst for photochemical purifying gas, a preparation method and application thereof. The catalystis of a heterogeneous multi-layer structure, wherein a layer of carriers is uniformly adhered on a substrate, and a layer of active ingredients is uniformly loaded on the carriers. A chemical gas-phase deposition method is adopted for uniformly depositing carrier precursors which correspond to the carriers on the surface of the substrate material, and roasting treatment can be performed to form acarrier film; a deposition-precipitation method is utilized for loading the active ingredients onto the carrier film; and the activation is performed to obtain the superposed film photocatalyst adhered on the substrate. The superposed film photocatalyst or a sticker thereof is put into air atmosphere, and volatile organic substances in air are removed through photocatalysis under certain temperature, humidity and light conditions. The method can be used under the room-temperature normal-pressure conditions, is free of secondary pollution and operation cost, and is suitable for an indoor and outdoor place. Compared with a conventional powder type photocatalyst coating, the catalyst is greatly reduced in dosage, and the cost is remarkably reduced.

Description

technical field [0001] The invention belongs to the technical field of air purification, and in particular relates to a laminated film photocatalyst for photocatalytic purification of gas, a preparation method and an application. Background technique [0002] Volatile organic compounds (VOCs) are one of the causes of smog and the main pollutants in indoor air. The removal of volatile organic compounds is of great significance to the governance of the atmospheric environment and the improvement of the living environment. [0003] Traditional VOCs treatment technologies include adsorption, condensation, combustion, catalytic combustion, and biodegradation. These VOCs degradation technologies have a good control effect on the corresponding pollutant sources. However, due to factors such as high operating costs, poor reliability, complicated operation, and secondary pollution, the above-mentioned traditional technologies are not suitable for the field of gas purification under...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/52B01J23/72B01D53/44B01D53/86
CPCB01D53/8687B01D2255/802B01D2257/708B01J23/52B01J23/72B01J35/004Y02A50/20
Inventor 朱晓兵刘晨阳李小松刘景林朱爱民
Owner DALIAN UNIV OF TECH
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